Overview
The journal is an international journal focusing on fundamental research and new developments in plasma chemistry and plasma processing.
- Check the aims and scope before submitting
- Publishes fundamental plasma studies and studies of specific applications
- Encompasses all types of industrial processing plasma
- Includes studies of chemical kinetics in plasma, and the interactions of plasma with surfaces
- Editor-in-Chief
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- Bruce R. Locke,
- Anthony Murphy
- Journal Impact Factor
- 2.6 (2023)
- 5-year Journal Impact Factor
- 2.9 (2023)
- Submission to first decision (median)
- 7 days
- Downloads
- 203,824 (2023)
Latest articles
Journal updates
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Editorial Procedure
Additional information about the peer review procedure for the journal.
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Highlights in PCPP
Our highlighted articles for the past 12 month
Journal information
- Electronic ISSN
- 1572-8986
- Print ISSN
- 0272-4324
- Abstracted and indexed in
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- Astrophysics Data System (ADS)
- Baidu
- CLOCKSS
- CNKI
- CNPIEC
- Chemical Abstracts Service (CAS)
- Current Contents/Electronics & Telecommunications Collection
- Current Contents/Engineering, Computing and Technology
- Current Contents/Physical, Chemical and Earth Sciences
- Dimensions
- EBSCO
- EI Compendex
- Google Scholar
- INSPEC
- Japanese Science and Technology Agency (JST)
- Naver
- OCLC WorldCat Discovery Service
- Portico
- ProQuest
- SCImago
- SCOPUS
- Science Citation Index Expanded (SCIE)
- Semantic Scholar
- TD Net Discovery Service
- UGC-CARE List (India)
- Wanfang
- Copyright information
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© Springer Science+Business Media, LLC, part of Springer Nature