Volume 3, Issue 3 | Plasma Chemistry and Plasma Processing

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Volume 3, Issue 3

September 1983

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5 articles in this issue

Electrical properties of plasma-polymerized thin organic films
Maciej Gazicki
H. Yasuda
OriginalPaper Pages: 279 - 327
Kinetic studies of SF₆ plasmas during etching of Si
Werner W. Brandt
John J. Wagner
OriginalPaper Pages: 329 - 336
Kinetic studies on CF₄ plasmas during etching of Si
Werner W. Brandt
Paul Roselle
OriginalPaper Pages: 337 - 342
Plasma chemical synthesis. I. Effect of electrode material on the synthesis of ammonia
Khin Swe Yin
Mundiyath Venugopalan
OriginalPaper Pages: 343 - 350
Behavior of small particles in a thermal plasma flow
Xi Chen
E. Pfender
OriginalPaper Pages: 351 - 366