1. Two-Term and multi-term approximation of the nonstationary electron velocity distribution in an electric field in a gas

   • D. Loffhagen
   • R. Winkler
   • G. L. Braglia

   OriginalPaper Pages: 287 - 300

2. A comparative study of CH₄ and CF₄ rf discharges using a consistent plasma physics and chemistry simulator

   • Nikolaos V. Mantzaris
   • Evangelos Gogolides
   • Andreas G. Boudouvis

   OriginalPaper Pages: 301 - 327

3. Oxidation of aromatic hydrocarbons with oxygen in a radiofrequency plasma

   • Meguru Tezuka
   • Tatsuhiko Yajima

   OriginalPaper Pages: 329 - 340

4. Plasma-induced deposition of titanium nitride from TiCl₄ in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation

   • Jörg Patscheider
   • Li Shizhi
   • Stan Vepřek

   OriginalPaper Pages: 341 - 363

5. Dry etching of InGaP and AlInP in CH₄/H₂/Ar

   • J. W. Lee
   • S. J. Pearton
   • F. Ren

   OriginalPaper Pages: 365 - 378

6. Numerical method and composition in multi-temperature plasmas: Application to an Ar-H₂ mixture

   • P. Andre
   • M. Abbaoui
   • M. J. Parizet

   OriginalPaper Pages: 379 - 398

7. Numerical analysis of the behavior of hydrogen added into a free-burning arc

   • Masaaki Suzuki
   • Yoshihumi Sato
   • Hiroshi Akatsuka

   OriginalPaper Pages: 399 - 415

8. Laser-based characterization of a flame-assisted plasma

   • M. Sassi
   • J. Hwang
   • J. W. Daily

   OriginalPaper Pages: 417 - 448

9. UV spectroscopy of metal volatilization during thermal plasma processing of waste glass melts

   • Jeffrey W. Wood
   • Rebecca Cortez
   • Hany H. Zaghlou

   OriginalPaper Pages: 449 - 460