Volume 16, Issue 3 | Plasma Chemistry and Plasma Processing

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Volume 16, Issue 3

September 1996

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9 articles in this issue

Two-Term and multi-term approximation of the nonstationary electron velocity distribution in an electric field in a gas
D. Loffhagen
R. Winkler
G. L. Braglia
OriginalPaper Pages: 287 - 300
A comparative study of CH₄ and CF₄ rf discharges using a consistent plasma physics and chemistry simulator
Nikolaos V. Mantzaris
Evangelos Gogolides
Andreas G. Boudouvis
OriginalPaper Pages: 301 - 327
Oxidation of aromatic hydrocarbons with oxygen in a radiofrequency plasma
Meguru Tezuka
Tatsuhiko Yajima
OriginalPaper Pages: 329 - 340
Plasma-induced deposition of titanium nitride from TiCl₄ in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation
Jörg Patscheider
Li Shizhi
Stan Vepřek
OriginalPaper Pages: 341 - 363
Dry etching of InGaP and AlInP in CH₄/H₂/Ar
J. W. Lee
S. J. Pearton
F. Ren
OriginalPaper Pages: 365 - 378
Numerical method and composition in multi-temperature plasmas: Application to an Ar-H₂ mixture
P. Andre
M. Abbaoui
M. J. Parizet
OriginalPaper Pages: 379 - 398
Numerical analysis of the behavior of hydrogen added into a free-burning arc
Masaaki Suzuki
Yoshihumi Sato
Hiroshi Akatsuka
OriginalPaper Pages: 399 - 415
Laser-based characterization of a flame-assisted plasma
M. Sassi
J. Hwang
J. W. Daily
OriginalPaper Pages: 417 - 448
UV spectroscopy of metal volatilization during thermal plasma processing of waste glass melts
Jeffrey W. Wood
Rebecca Cortez
Hany H. Zaghlou
OriginalPaper Pages: 449 - 460