1. Quartz crystal microbalance simulation of the directionality of Si etching in CF₄ glow discharges

   • Natasha C.Us
   • R. W. Sadowski
   • J. W. Coburn

   OriginalPaper Pages: 1 - 10

2. Gas-phase reactions of CF₃ and CF₂ with atomic and molecular fluorine: Their significance in plasma etching

   • I. C. Plumb
   • K. R. Ryan

   OriginalPaper Pages: 11 - 25

3. Electric discharge-induced oxidation of hydrogen cyanide

   • Mark E. Fraser
   • Ronald S. Sheinson

   OriginalPaper Pages: 27 - 38

4. Kinetics and mechanism in the decomposition of NH₃ in a radio-frequency pulse discharge

   • John E. Nicholas
   • Andrew I. Spiers
   • Nicholas A. Martin

   OriginalPaper Pages: 39 - 51

5. Nitriding of niobium and tantalum with a plasma jet under reduced pressure

   • Toshiro Kotaki
   • Osamu Matsumoto

   OriginalPaper Pages: 53 - 63

6. Calculation of thermodynamic properties and transport coefficients for SF₆-N₂ mixtures in the temperature range 1,000–30,000 K

   • A. Gleizes
   • M. Razafinimanana
   • S. Vacquie

   OriginalPaper Pages: 65 - 78

7. Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing

   • M. Chaker
   • M. Moisan
   • Z. Zakrzewski

   OriginalPaper Pages: 79 - 96

8. Chemical processes in a plasma centrifuge

   • S. V. Korobtsev
   • T. A. Kosinova
   • V. D. Rusanov

   OriginalPaper Pages: 97 - 107