Microplasma: A New Generation of Technology for Functional Nanomaterial Synthesis Liangliang LinQi Wang Review Article Open access 15 August 2015 Pages: 925 - 962
Deposition of Ni Coatings by Electrolytic Plasma Processing A. SmithR. KeltonE. I. Meletis Original Paper 20 August 2015 Pages: 963 - 978
Nitrogen Atmospheric-Pressure-Plasma-Jet Induced Oxidation of SnOx Thin Films Guan-Wei LinYu-Hao JiangJian-Zhang Chen Original Paper 29 August 2015 Pages: 979 - 991
Spectroscopic Characterization of Argon–Nitrogen Surface-Wave Discharges in Dielectric Tubes at Atmospheric Pressure J. A. BravoR. RincónM. D. Calzada Original Paper 04 September 2015 Pages: 993 - 1014
Atmospheric Pressure Plasma Polymerization of Super-Hydrophobic Nano-films Using Hexamethyldisilazane Monomer Chun HuangHsin-Hua LinChun Li Original Paper 15 August 2015 Pages: 1015 - 1028
Experimental Study of the Transient Response of Bunsen Flame to Nanosecond Pulsed Discharges Shaohua ZhangXilong YuFei Li Original Paper 09 August 2015 Pages: 1029 - 1042
Generation of In-Package Cold Plasma and Efficacy Assessment Using Methylene Blue N. N. MisraK. M. KeenerP. J. Cullen Original Paper 04 August 2015 Pages: 1043 - 1056
On the Gas Heating Mechanism for the Fast Anode Arc Reattachment in a Non-transferred Arc Plasma Torch Operating with Nitrogen Gas in the Restrike Mode L. PrevostoH. KellyJ. C. Chamorro Original Paper 14 August 2015 Pages: 1057 - 1070
Properties of Argon–Nitrogen Atmospheric Pressure DC Arc Plasma Dragan RankovicMiroslav KuzmanovicJelena Savovic Original Paper 02 August 2015 Pages: 1071 - 1095
On the Selection of Integration Intervals for the Calculation of Mean Absorption Coefficients P. KlocV. AubrechtCh. Rümpler Original Paper Open access 07 September 2015 Pages: 1097 - 1110
Hydrogen Reduction of Germanium Tetrafluoride in RF-Discharge R. A. KornevP. G. Sennikov Original Paper 05 August 2015 Pages: 1111 - 1118
Pressure-Dependent Etching Mechanism and Induced Dielectric Properties Variation of BZN Thin Films in SF6/Ar Plasma Liping DaiWenping SongGuojun Zhang Original Paper 06 August 2015 Pages: 1119 - 1127
A Model-Based Comparative Study of HCl and HBr Plasma Chemistries for Dry Etching Purposes Alexander EfremovJoon Hyub KimKwang-Ho Kwon Original Paper 07 August 2015 Pages: 1129 - 1142