Effect of the plasma surface treatment on an anatase TiO2 film Yoshiaki ChibaHideki KokaiKunihiro Kashiwagi OriginalPaper Pages: 645 - 648
Physical properties of natively textured yttrium doped zinc oxide films by sol-gel R. KaurA. V. SinghR. M. Mehra OriginalPaper Pages: 649 - 655
Optical, structural and electrical characteristics of aluminum oxynitride thin films deposited in an Ar-N gas mixture RF-sputtering system J. J. AraizaM. Aguilar-FrutisMa. Jergel OriginalPaper Pages: 657 - 661
Improved dielectric properties in pyrochlore type oxides: Ca3Sm3−xBi x Ti7Nb2O26.5 (x = 1.0, 2.0 or 3.0) by Bi substitution P. Prabhakar RaoK. Ravindran NairV. K. Vaidyan OriginalPaper Pages: 663 - 666
Dielectric properties of Be(IO3)2⋅4H2O crystals M. M. NadoliiskyM. P. GeorgievV. A. Karadjova OriginalPaper Pages: 667 - 668
Influence of 3d-elements on dielectric properties of BaTiO3 ceramics Shuren ZhangSheng WangZhu Chen OriginalPaper Pages: 669 - 672
On the use of a neural network to characterize the plasma etching of SiON thin films B. KimB. T. LeeK. K. Lee OriginalPaper Pages: 673 - 679
Study on pore-forming agents in processing of porous piezoceramics B. Praveen KumarH. H. KumarD. K. Kharat OriginalPaper Pages: 681 - 686
Structural and electrical properties of perovskite ruthenate-based lead-free thick film resistors on alumina and LTCC S. RaneM. PrudenziatiA. Dziedzic OriginalPaper Pages: 687 - 691
Microstructural damage analysis of SnAgCu solder joints and an assessment on indentation procedures M. ErinçP. J. G. SchreursM. G. D. Geers OriginalPaper Pages: 693 - 700
