Abstract
In this work, Schottky diodes are fabricated on n-InP using Ru/Cu metallization scheme and studied the electrical properties in the temperature range of 260–420 K in steps of 20 K. The I–V–T characteristics of Ru/Cu Schottky contacts are analyzed in terms of thermionic emission theory by incorporating the concept of barrier inhomogenities through a Gaussian distribution function. The estimated barrier heights (BHs) of the Ru/Cu/n-InP Schottky barrier diodes (SBDs) are varied from 0.45 eV (I–V), 0.84 eV (C–V) at 260 K to 0.63 eV (I–V), 0.64 eV (C–V) at 420 K. The ideality factors n are varied from 2.50 at 260 K to 1.67 at 420 K. The calculated series resistance (R s) of the Ru/Cu/n-InP SBD is in the range of 2,703 Ω at 260 K to 134 Ω at 420 K. From the above observations, Φb0, n and R s are strongly temperature dependent. A laterally homogeneous BH value of approximately 0.77 eV for the linear relationship between experimental effective BHs and ideality factors that can be explained by lateral inhomogenities. Furthermore, the mean BH and the Richardson constant values are obtained to be 0.91 eV and 8.41 A K−2 cm−2, respectively, by means of the modified Richardson plot ln(I 0/T 2) − (q 2σ 20 /2k 2 T 2) vs. 1,000/T. The inconsistency between BHs obtained from I–V and C–V measurements is also interpreted.
Similar content being viewed by others
References
C W Wilmsen Physics and Chemistry of III–V Compound Semiconductor Interfaces (New York: Plenum) (1985)
E H Rhoderick and R H Williams Metal Semiconductor Contacts (Oxford: Clarendon Press) (1988)
H K Henisch Semiconductor Contacts (London: Oxford University) (1984)
P K Bhattacharya, J W Ku, S J T Owen, S H Chiao and R Yeats Electron. Lett. 15 753 (1979)
L Messick Solid State Electron. 23 551 (1980)
M Ogura, K Inoue, Y Ban, T Uno, M Morisaki and N Hase Jpn. J. Appl. Phys. 21 L548 (1981)
D L Lile and D A Collins IEEE Trans. Electron. Dev. 29 842 (1982)
S Chand and J Kumar Semicond. Sci. Technol. 10 1680 (1995)
S Karatas, S Altindal and M Cakar Physica B 357 373 (2005)
R Hackam and P Horrop IEEE Trans. Electron. Dev. 19 1231 (1972)
A S Bhuiyan, A Martinez and D Esteve Thin Solid Films 161 93 (1988)
B Saha, R Thapa, S Jana and K K Chattopadhay Indian J. Phys. 84 1341 (2010)
J Bhadra and D Sarkar Indian J. Phys. 84 693 (2010)
B Saha, R Thapa, N S Das and K K Chattopadhay Indian J. Phys. 84 681 (2010)
R Thapa, B Saha, S Goswami and K K Chattopadhay Indian J. Phys. 84 1347 (2010)
J Bhadra and D Sarkar Indian J. Phys. 84 1321 (2010)
P Saikia, A Borthakur and P K Saikia Indian J. Phys. 85 551 (2011)
M K Hudait, K P Venkateswarlu and S B Krupanidhi Solid State Electron. 45 133 (2001)
M K Hudait and S B Krupanidhi Physica B 307 125 (2001)
S Chand and J Kumar J. Appl. Phys. 80 288 (1996)
J H Werner and H H Guttler J. Appl. Phys. 69 1522 (1991)
C T Chuang Solid State Electron. 27 299 (1984)
R T Tung Phys. Rev. B 45 13509 (1992)
F A Padovani Semiconductor and Semimetals (eds.) R K Wilardson and A C Beer (New York: Academic Press), Vol. 7A (1971)
C R Crowell Solid State Electron. 20 171 (1977)
R T Tung, J P Sullivan and F Schery Mater. Sci. Eng. B 14 266 (1992)
R F Schmitsdorf, T U Kampen and W Monch J. Vac. Technol. B 15 1221 (1997)
S Y Zhu, R L Van Meirhaeghe, C Detavernier, F Cardon, G P Ru, X P Qu, and B Z Li Solid State Electron. 44 663 (2000)
I Dokmee and S Altindal Semicond. Sci. Technol. 21 1053 (2006)
Y P Song, R L Van Meirhaeghe, W H Laflere and P Cardon Solid State Electron. 29 633 (1986)
J H Werner and H H Guttler J. Appl. Phys. 73 1315 (1993)
A Gumus, A Turut and N Yalcin J. Appl. Phys. 91 245 (2002)
S Bandyopadyay, A Battacharya and S K Sen J. Appl. Phys. 85 3671 (1999)
M C Lonergan and F E Zones J. Chem. Phys. 115 433 (2001)
S M Sze Physics of Semiconductor Devices (New York: Wiley) (1985)
H Cetin and E Ayyildiz Semicond. Sci. Technol. 20 625 (2005)
F E Cimilli, M. Saglam and A Turut Semicond. Sci. Technol. 22 851 (2007)
M Soylu and B Abay Microelectron. Eng. 86 88 (2009)
H Cetin and E Ayyildiz Physica B 405 559 (2010)
V Janardhanam, A Ashok Kumar, V Rajagopal Reddy and P Narasimha Reddy J. Optoelectron. Adv. Mater. 2 735 (2008)
M Bhaskar Reddy, A Ashok Kumar, V Janardhanam, V Rajagopal Reddy and P Narasimha Reddy Curr. Appl. Phys. 9 972 (2009)
N Nanda Kumar Reddy and V Rajagopal Reddy Optoelectron. Adv. Mater. Rapid Commun. 4 1229 (2010)
H C Card and E H Rheodrick J. Appl. Phys. D 4 1589 (1971)
S Altindal, S Karadeniz, N Tugluoglu and A Tataroglu Solid State Electron. 47 1847 (2003)
S. Karatas, S Altindal, A Turut and A Ozmen Appl. Surf. Sci. 217 250 (2003)
S Ashok, J M Borrego and R J Gutmann Solid State Electron. 22 621 (1979)
F A Padovani and G Summer Appl. Phys. A 36 3744 (1965)
M Saglam, E Ayildiz, A Gumus, A Turut, H Efeoglu and S. Tuzemen Appl. Phys. A 62 269 (1996)
S K Cheung and N W Cheung Appl. Phys. Lett. 49 85 (1986)
A Singh Solid State Electron. 28 233 (1985)
W P Kang, J L Davidson, Y Gurbuz and D V Kerns J. Appl. Phys. 78 1101 (1995)
S Chand and J Kumar Appl. Phys. A 63 171 (1996)
R F Schmitsdorf, T U Kampen and W Monch Surf. Sci. 324 249 (1995)
R T Tung Mater. Sci. Eng. R 35 1 (2001)
Zs J Horvath Solid State Electron. 39 176 (1996)
P G McCaffery, A Sellai, P Dawson and H Elabd Solid State Electron. 39 583 (1996)
J P Sullivan, R T Tung, M R Pinto and W R Graham J. Appl. Phys. 70 7403 (1991)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Lakshmi Devi, V., Jyothi, I. & Rajagopal Reddy, V. Electrical transport properties of Ru/Cu/n-InP Schottky barrier diode based on temperature-dependent I–V and C–V measurements. Indian J Phys 86, 687–695 (2012). https://doi.org/10.1007/s12648-012-0118-y
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s12648-012-0118-y