Abstract
Fe-5wt%Al films were RF-sputtered and annealed in an atmosphere of hydrogen and water vapor mixture at 1173 K for up to 200 min in order to selectively oxidize aluminum. As the annealing time increased, the morphology of the films changed from the continuous to the discontinuous type; thus, particulate Fe-Al films formed after 100 min. Thermodynamics simulation was performed to determine the ideal conditions for this process. Temperatures exceeding 1073 K are necessary to prevent iron from oxidation confirmed by both the depth profile in XPS and magnetic moment increment in VSM. Annealing the films in an atmosphere with a very low dew point of 77 K did not make the films become particulate. New findings are expected to be applied to the thin film inductors for GHz application as well as to manufacturing process of nanoparticles.
This is a preview of subscription content, log in via an institution to check access.
References
R. E. Grace and A. U. Seybolt, J. Elec. Chem. Soc. 105, 582 (1958).
M. Kitano, H. Ishi, Y. Shirai, and T. Ohmi, J. Vac. Sci. Technol. A 29, 021002 (2011).
T. Nakayama and K. Kaneko, Corrosion-NACE 26, 187 (1970).
V. K. Tolpygo and D. R. Clarke, Mater. High Temp. 20, 261 (2003).
W. C. Reynolds, Dept. Mech. Eng., Stanford University, US (1986).
D. R. Lide, Handbook of Chemistry and Physics, 86th ed., pp.6–7, CRC Press, Boca Raton (2005).
M. L. Colaianni, P. J. Chen, and J. T. Yates, Surf. Sci. 238, 13 (1990).
A. Arranz, V. Pérez-Dieste, and C. Palacio, Surf. Sci. 521, 77 (2002).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Jang, P., Shin, S.C. Formation of particulate Fe-Al films by selective oxidation of aluminum. Met. Mater. Int. 19, 1163–1166 (2013). https://doi.org/10.1007/s12540-013-5036-9
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s12540-013-5036-9