Abstract
Vanadium oxide (V2O5) thin films have been deposited on to the stainless-steel substrates by simple dip-coating technique using vanadium pentaoxide as an initial ingredient. Deposited samples were annealed at 773 K for 3 h in air. X-ray diffraction analysis of the sample shows crystalline with orthorhombic crystal structure. Scanning electron microscopy study depicts the homogeneous and dense surface morphology. Optical study proves the direct bandgap transition with energy ∼2.25 eV. Electrochemical performance of the deposited electrode was studied in 1 M NaNO 3 electrolyte using cyclic voltammetery, electrochemical impedance spectroscopy and galvanostatic charge–discharge tests. Prepared V2O5 electrode shows 207.50 F g−1 specific capacitance at the scan rate 5 mV s−1, specific energy, specific power and efficiency are 41.33 Wh kg−1, 21 kW kg−1 and 96.72%, respectively. The internal resistance observed from impedance spectroscopy is ∼8.77 ohm. Electrode exhibits excellent chemical stability up to 1000 cycles.
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Sarangapani S, Tilak B V and Chen C P 1996 J. Electrochem. Soc. 143 3791
Yan Y, Kim D H, Yang M and Schmuki P 2011 Chem. Commun. 47 7746
Hu C C and Tsou T W 2002 Electrochem. Commun. 4 105
Chen L M, Lai Q Y, Hao Y J, Zhao Y and Ji X Y 2009 , J. Alloys Compd. 467 465
Conway B E 1999 Electrochemical supercapacitors (New York: Kluwer-Plenum)
Pang S C, Anderson M A and Chapman T W 2000 , J. Electrochem. Soc. 147 44
Xia N, Zhou T, Mo S, Zhou S, Zou W and Yuan D 2011 , J. Appl. Electrochem. 41 71
Mayer S T, Pekala R W and Kaschmitter J L 1993 J. Electrochem. Soc. 140 446
Prasad K R and Munichandraian N 2002 J. Electrochem. Soc. 149 A1393
Mitra S, Shukla A K and Sampath S 2001 J. Power Sources 101 213
Hu C C and Huang Y H 1999 J. Electrochem. Soc. 146 2465
Lokhande C D, Dubal D P and Joo O -S 2011, Curr. Appl. Phys. 11 270
Zheng J P and Jow T R 1995 J. Electrochem. Soc. 142 2699
Hu C C, Huang Y H and Chang K H 2002 J. Power Sources 108 117
Chang C and Chang K H 2000 Electrochim. Acta 45 2685
Cheng F, He C, Shua D, Chen H, Zhang J, Tang S and Finlow E D 2011 Mater. Chem. Phys. 131 268
Qu Q T, Shi Y, Li L L, Guo W L, Wu Y P, Zhang H P, Guan S Y and Holze R 2009 Electrochem. Commun. 11 1325
Lota G, Frackowiak E, Mittal J and Monthioux M 2007 Chem. Phys. Lett. 434 73
Thomberg T, Kurig H, Jänes A and Lust E 2011 Microporous Mesoporous Mater. 141 88
Hua C -C, Huang C -M and Chang K -H 2008, J. Power Sources 185 1594
Si Y C, Jiao L F, Yuan H T, Li H X and Wang Y M 2009 , J. Alloys Compd. 486 400
Lee S M, Kim H S and Seong T Y 2011 J. Alloys Compd. 509 3136
Cai C, Guan D S and Wang Y 2011 J. Alloys Compd. 509 909
Wang S Q, Lu Z D, Wang D, Li C G, Chen C H and Yin Y D 2011 J. Mater. Chem. 21 6365
Gu G, Schmid M, Chiu P W, Kozlov M, Munoz E and Baughman R H 2003 Nat. Mater. 2 316
Strelcov E, Lilach Y and Kolmakov A 2009 Nano Lett. 9 2322
Nair H, Gatt J E, Miller J T and Baertsch C D 2011 J. Catal. 279 144
Wu C Z, Wei H, Ning B and Xie Y 2010 Adv. Mater. 22 1972
Lee H Y and Goodenough J B 1999 J. Solid State Chem. 148 81
Li J M, Chang K H and Hu C C 2010 Electrochem. Commun. 12 1800
Chen L M, Lai Q Y, Zeng H M, Hao Y J and Huang J H 2011 J. Appl. Electrochem. 41 299
Wang Y and Cao G 2006 Chem. Mater. 18 2787
Liu Y Y, Clark M, Zhang Q F, Yu D M, Liu D W, Liu J and Cao G Z 2011 Adv. Energy Mater. 1 194
Julien C, Guesdon J P, Gorenstein A, Khelfa A and Ivanov I 1995 Appl. Surf. Sci. 90 389
Ozer N and Lampert C M 1999 Thin Solid Films 349 205
Papaefthimiou S, Leftheriotis G and Yianoulis P 1999 Thin Solid Films 343 183
Capone S, Rella R, Siciliano P and Vasanelli L 1999 Thin Solid Films 350 264
MuthuKaruppasamy K 2008 Sol. Energy Mater. Sol. Cells 92 1322
Patil C E, Tarwal N L, Shinde P S, Deshmukh H P and Patil P S 2009 J. Phys. D Appl. Phys. 42 025404
Borlaf M, Colomer M T, Moreno R and Ortizb A L 2014 , J. Eur. Ceram. Soc. 34 4457
Yimsiri P and Mackley M R 2006 Chem. Eng. Sci. 61 3496
Goncalves P R G, Rangel J H G, Oliveira M M, Maciel A P and Longo E 2014 Ceram. Int. 40 12359
Darling R B and Iwanaga S 2009 Sadhana 34 531
Lokhande B J, Ambare R C, Mane R S and Bharadwaj S R 2013 Mater. Res. Bull. 48 2978
Hu C, Yuan S and Hu S 2006 Electrochim. Acta 51 3013
Wang C T and Huang H H 2008 J. Non-Cryst. Solids 354 3336
Cullity B D 1978 Elements of X-ray diffraction 2nd edn. (Reading, Massachusetts, USA: Addison-Wesley Publishing Company) Vol. 284
Ambare R C and Lokhande B J 2011 Inverties J. Renew. Energy 1 1
Tauc J, Grigorovici R and Vancu A 1966 Phys. Status Solidi 1515 627
Lokhande B J, Ambare R C, Mane R S and Bharadwaj S R 2013 Curr. Appl. Phys. 13 985
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INGOLE, R.S., LOKHANDE, B.J. Electrochemical properties of dip-coated vanadium pentaoxide thin films. Bull Mater Sci 39, 1603–1608 (2016). https://doi.org/10.1007/s12034-016-1292-x
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DOI: https://doi.org/10.1007/s12034-016-1292-x