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Metal silicides: An integral part of microelectronics

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Abstract

This article presents an overview of the recent developments in the fundamental understandings and microelectronics applications of metal silicides. The synthesis and characterization of nanoscale silicides with potential applications in nanotechnology are reviewed.

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Authors and Affiliations

  1. the Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan

    L. J. Chen (Ministry of Education National Chair Professor)

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  1. L. J. Chen
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Editor’s Note: A hypertext-enhanced version of this article is available on-line at www.tms.org/pubs/journals/JOM/0509/Chen0509.html.

For more information, contact L.J. Chen, National Tsing Hua University, Department of Materials Science and Engineering, Hsinchu, Taiwan, +886-3-573-1166; fax +886-3-571-8328; e-mail ljchen@mx.nthu.edu.tw.

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Chen, L.J. Metal silicides: An integral part of microelectronics. JOM 57, 24–30 (2005). https://doi.org/10.1007/s11837-005-0111-4

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