Enhanced photonic nanojets for submicron patterning

Abstract

Photonic nanojets (PNJs) have a wide range of applications in laser processing, nanolithography, optical high-density storage, super-resolution microscopy, and other fields due to their processing capacity to overcome the diffraction limit. Herein, we control static microsphere be developed into the motion state to fabricate vector graphics nano-grooves. The microspheres roll on the substrate while the laser is kept synchronously irradiated, and the overlapping PNJ ablated craters form patterned grooves on the indium-tin oxide (ITO) substrate. Thus, PNJ has been expanded from “point” processing to “line” processing. The fabricated nano grooves have high continuity and consistency. Whereas, the precise customization of critical groove dimension can be achieved via modulation in diameter and kinetics of dielectric microshperes. Furthermore, by etching vectographs on an ITO conductive glass substrate, we demonstrated the advantages and potential of the proposed method in nanopatterning. The proposed method effectively reduces the cost and complexity of photonic nanojets applied in nanopatterning. The proposed nanopatterning methodology will play a vital role in the fabrication of semiconductor materials, sensors, microfluidic devices, surface-enhanced Raman scattering (SERS), biomedicine, nanoscience and nanoengineering.

摘要

光子纳米射流由于其具有克服衍射极限的处理能力，在激光加工、纳米光刻、光学高密度存 储、超分辨率显微等领域有着广泛的应用。本文通过将静态微球转变为运动状态，在激光同步辐照 下，重叠烧蚀的坑在ITO基板上形成图形化的纳米凹槽。由此，光子纳米射流从“点”加工扩展到 “线”加工。所制备的纳米沟槽具有良好的连续性和一致性。此外，沟槽的尺寸形貌可以通过调控微 球直径和刻蚀速度来实现。最后，通过在ITO玻璃衬底上刻蚀矢量图，证明了该方法在微纳制造方面 的优势和潜力。此方法将在半导体材料、传感器、微流控器件、表面增强拉曼散射(SERS)、生物医 学、纳米科学和纳米工程等领域发挥重要作用。