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Influence of deposition temperature on the structure and optical properties of HfO2 thin films

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Abstract

Hafnium oxide (HfO2) thin films were deposited on Si (001) substrates by electron beam evaporation at various growth temperatures. It was found that the film was amorphous when deposited at temperatures lower than 200°C. It was polycrystalline when deposited at 250°C and 300°C. At temperatures above 400°C, it was grown preferably along the [111] direction. The influence of growth temperature on the surface morphology and optical property was also investigated.

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Authors and Affiliations

  1. Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China

    Jie Ni, Zheng-cao Li & Zheng-jun Zhang

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  1. Jie Ni
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  2. Zheng-cao Li
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  3. Zheng-jun Zhang
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Correspondence to Zheng-jun Zhang.

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Ni, J., Li, Zc. & Zhang, Zj. Influence of deposition temperature on the structure and optical properties of HfO2 thin films. Front. Mater. Sci. China 2, 381–385 (2008). https://doi.org/10.1007/s11706-008-0066-9

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  • DOI: https://doi.org/10.1007/s11706-008-0066-9

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