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Deposition of an Ultraflat Graphene Oxide Nanosheet on Atomically Flat Substrates

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Abstract

In this study, graphene oxide (GO) sheets produced in the form of stable aqueous dispersions were deposited on Au (111), freshly cleaved mica, and highly oriented pyrolytic graphite (HOPG) substrates. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were used to study the presence and distinct contact of GO sheets on the substrates. It was revealed from the topography images that high-quality ultraflat GO monolayer sheets formed on the substrates without distinct cracking/wrinkling or folding. GO sheets with apparent height variation observed by microscopy also indicate ultraflat deposition with clear underlying steps. It was observed that ultrasonication and centrifuge steps prior to deposition were very effective for getting oxidation debris (OD)-free ultraflat single monolayer GO nanosheets onto substrates and that the process depends on the concentration of supplied GO solutions.

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Authors and Affiliations

  1. Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, 2-1-1, Katahira, Aoba-Ku, Sendai, 980-0877, Japan

    M. Z. H. Khan, S. M. F. Shahed & T. Komeda

  2. Department of Chemical Engineering, Jessore University of Science and Technology, Jessore, 7408, Bangladesh

    M. Z. H. Khan

  3. Research Core for Interdisciplinary Sciences, Okayama University, Tsushimanaka, Kita-ku, Okayama, 700-8530, Japan

    N. Yuta

Authors
  1. M. Z. H. Khan
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  2. S. M. F. Shahed
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  3. N. Yuta
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  4. T. Komeda
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Correspondence to T. Komeda.

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Khan, M.Z.H., Shahed, S.M.F., Yuta, N. et al. Deposition of an Ultraflat Graphene Oxide Nanosheet on Atomically Flat Substrates. J. Electron. Mater. 46, 4160–4165 (2017). https://doi.org/10.1007/s11664-017-5327-x

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  • DOI: https://doi.org/10.1007/s11664-017-5327-x

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