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Aqueous-Develop, Photosensitive Polynorbornene Dielectric: Properties and Characterization

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Abstract

The properties of a new aqueous-base-develop, negative-tone photosensitive polynorbornene have been characterized. High-aspect-ratio features of 7:1 (height:width) were produced in 70-μm-thick films in a single coat with straight side-wall profiles and high fidelity. The polymer films studied had contrast of 12.2 and low absorption coefficient. To evaluate the polymer’s suitability to microelectronics applications, epoxy crosslinking reactions were studied as a function of processing condition through Fourier-transform infrared spectroscopy, nanoindentation, and dielectric measurements. The fully crosslinked films had an elastic modulus of 2.9 GPa and hardness of 0.18 GPa.

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Authors and Affiliations

  1. School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive, Atlanta, GA, 30332-0100, USA

    Venmathy Rajarathinam, C. Hunter Lightsey, Tyler Osborn, Sue Ann Bidstrup Allen & Paul A. Kohl

  2. Promerus LLC, 9921 Brecksville Road, Brecksville, OH, 44141, USA

    Brian Knapp & Edmund Elce

Authors
  1. Venmathy Rajarathinam
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  2. C. Hunter Lightsey
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  3. Tyler Osborn
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  4. Brian Knapp
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  5. Edmund Elce
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  6. Sue Ann Bidstrup Allen
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  7. Paul A. Kohl
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Correspondence to Venmathy Rajarathinam.

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Rajarathinam, V., Lightsey, C.H., Osborn, T. et al. Aqueous-Develop, Photosensitive Polynorbornene Dielectric: Properties and Characterization. J. Electron. Mater. 38, 778–786 (2009). https://doi.org/10.1007/s11664-009-0741-3

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  • DOI: https://doi.org/10.1007/s11664-009-0741-3

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