Abstract
In this study, the current density-voltage (J-V) characteristic of Schottky diodes of indium-tin-oxide (ITO) contacts to p-type GaN (p-GaN) has been investigated. The calculated barrier-height value of ITO/p-GaN samples using the thermionic field-emission (TFE) model is 3.2 eV, which implies that the work function of ITO is equal to 4.3 eV. The result is supported by J-V measurements of ITO/n-type GaN Schottky diodes. On the other hand, the barrier height of ITO/p-GaN was also determined from x-ray photoelectron spectroscopy (XPS) data. The analysis of the XPS spectral shifts indicated that this observed barrier-height value of ITO/p-GaN by XPS is in good agreement with the value of 3.2 eV obtained from J-V measurements.
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S.Y. Kim, H.W. Jang, and J.L. Lee, Appl. Phys. Lett. 82, 61 (2003).
R.H. Horng, D.S. Wuu, Y.C. Lien, and W.H. Lan, Appl. Phys. Lett. 79, 2925 (2001).
N. Biyikli, T. Kartaloglu, O. Aytur, I. Kimukin, and E. Ozbay, Appl. Phys. Lett. 79, 2838 (2001).
T. Margalith, O. Buchinsky, D.A. Cohen, A.C. Abare, M. Hansen, S.P. DenBaars, and L.A. Coldren, Appl. Phys. Lett. 74, 3930 (1999).
J.K. Shen, Y.K. Su, G.C. Chi, M.J. Jou, and C.M. Chang, Appl. Phys. Lett. 72, 3317 (1998).
T. Mori, T. Kozawa, T. Ohwaki, Y. Taga, S. Naagai, S. Yamasaki, S. Asami, N. Shibata, and M. Koike, Appl. Phys. Lett. 69, 3537 (1996).
H. Ishikawa, S. Kobayashi, Y. Koide, S. Yamasaki, S. Nagai, J. Umezaki, M. Koike, and M. Murakami, J. Appl. Phys. 81, 1315 (1997).
L.S. Yu, D. Qiao, L. Jia, S.S. Lau, Y. Qi, and K.M. Lau, Appl. Phys. Lett. 79, 4536 (2001).
J.K. Ho, C.S. Jong, C.N. Huang, C.C. Chiu, K.K. Shih, L.C. Chen, F.R. Chen, and J.J. Kai, J. Appl. Phys. 86, 4491 (1999).
M. Shur, Physics of Semiconductor Devices (Englewood Cliffs, NJ: Prentice-Hall, 1990), pp. 204–209.
H. Morkoç, Nitride Semiconductors and Devices (Berlin: Springer, 1999), pp. 198–200.
C. Merz, M. Kunzer, U. Kaufmann, I. Akasaki, and H. Amano, Semicond. Sci. Technol. 11, 712 (1996).
M. Razeghi and A. Rogalski, J. Appl. Phys. 79, 7433 (1996).
J.I. Pankove, S. Bloom, and G. Harbeke, RCA Rev. 36, 163 (1975).
H. Nakayama, P. Hacke, M.R.H. Khan, T. Detch-Prohm, K. Hiramatsu, and N. Sawaki, Jpn. J. Appl. Phys. 35, L282 (1996).
J.S. Kwak, O.H. Nam, and Y. Park, Appl. Phys. Lett. 80, 3554 (2002).
P. Kozodoy, H. Xing, S.P. DenBaars, U.K. Mishira, A. Saxler, R. Perrin, S. Elhamri, and W.C. Mitchel, J. Appl. Phys. 87, 1832 (2000).
B.L. Sharma, Metal-Semiconductor Schottky Barrier Junctions and Their Applications (New York: Plenum Press, 1984), pp. 2–8.
S. Arulkumaran, T. Egawa, H. Ishikawa, T. Jimbo, and M. Umeno, Appl. Phys. Lett. 73, 809 (1998).
D.J. Milliron, I.G. Hill, C. Shen, A. Kahn, and J. Schwartz, J. Appl. Phys. 87, 572 (2000).
F. Nüesch, L.J. Rothberg, E.W. Forsythe, Q.T. Le, and Y. Gao, Appl. Phys. Lett. 74, 880 (1999).
A.C. Schmitz, A.T. Ping, M.A. Khan, Q. Chen, J.W. Yang, and I. Adesida, J. Electron. Mater. 27, 255 (1998).
J.R. Waldrop and R.W. Grant, Appl. Phys. Lett. 52, 1794 (1988).
J.R. Waldrop and R.W. Grant, Appl. Phys. Lett. 62, 2685 (1993).
K.M. Tracy, P.J. Hartlieb, S. Einfeldt, F. Davis, E.H. Hurt, and R.J. Nemanich, J. Appl. Phys. 94, 3939 (2003).
T. Hashizume, S. Ootomo, S. Oyama, M. Konishi, and H. Hasegawa, J. Vac. Sci. Technol. B 19, 1675 (2001).
V.M. Bermudez, J. Appl. Phys. 80, 1190 (1996).
J.R. Waldrop and R.W. Grant, Appl. Phys. Lett. 68, 2879 (1996).
C.I. Wu and A. Kahn, J. Appl. Phys. 86, 3209 (1999).
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Lin, YJ., Hsu, CW. Study of schottky barrier heights of indium-tin-oxide on p-GaN using x-ray photoelectron spectroscopy and current-voltage measurements. J. Electron. Mater. 33, 1036–1040 (2004). https://doi.org/10.1007/s11664-004-0032-y
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DOI: https://doi.org/10.1007/s11664-004-0032-y