Abstract
The relationship between microstructure and fatigue crack growth behavior was examined at Sn-Ag solder interfaces on copper and electroless-nickel metallizations. On copper metallization, the solder interface was lined with a coarse Ag3Sn intermetallic phase in addition to the Cu6Sn5 intermetallic and the adjacent solder alloy contained nodular Ag3Sn phase. This interfacial microstructure was shown to result in inferior fatigue resistance, with the fatigue crack path following the interfacial Ag3Sn intermetallic phase. In contrast, the solder interface on the electroless-nickel metallization was covered with a thin layer of Ni3Sn4 intermetallic phase, and the solder microstructure was composed of fine needles of Ag3Sn phase dispersed in the Sn-rich matrix. This solder interface was found to be significantly more resistant to fatigue than the copper/Sn-Ag solder interface.
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References
J. Glazer, Int. Mater. Rev. 40, 65 (1995).
B.R. Allenby et al., Proc. Surface Mount Int. Conf. (1992), p. 1.
P.G. Harris and M.A. Whitmore, Circuit World 19, 25 (1993).
J. Glazer, J. Electron. Mater. 23, 693 (1994).
W.J. Tomlinson and A. Fullylove, J. Mater. Sci. 27, 5777 (1992).
S.K. Kang and A.K. Sarkhel, J. Electron. Mater. 23, 701 (1994).
H.D. Solomon, Trans. ASME J. Electron Packaging 113, 102 (1991).
J.S. Hwang and R.M. Vargas, Soldering & Surface Mount Technol. 5, 38 (1990).
C. Melton, JOM 45 (7), 33 (1993).
D. Yao and J.K. Shang, IEEE Transaction: CPMT 19, 154 (1996).
J.K. Shang and D. Yao, Trans. ASME J. Electronic Packaging 118, 170 (1996).
G.O. Mallory and J.B. Hajdu, Electroless Plating, Fundamentals and Applications (1990).
W. Riedel, Electroless Nickel Plating, (1991).
J.K. Dennis and T.E. Such, Nickel and Chromium Plating, (Cambridge, U.K.: University Press, 1986).
R.N. Duncan, Proc. EN ’93 Conf. (1993), p. 27–2.
Z. Zhang and J.K. Shang, Metall. Mater. Trans. A 27A, 205 (1996).
D.R. Flanders, E.G. Jacobs, and R.F. Pinizzotto, J. Electron. Mate. 26, 883 (1997).
W. Yang, L. E. Felton, and R.W. Messler, Jr., J. Electron. Mater. 24, 1465 (1995).
D.R. Frear, F.M. Hosking, and P.T. Vianco, Proc. Materials Developments in Microelectronic Packaging Conf. (1991), p. 229.
D. Yao and J.K. Shang, Metall. Mater. Trans. 26A, 2677 (1995).
R. Darveaux and K. Banerji, IEEE Trans. Comp. Hybrids. Manuf. Technol. 12, 284 (1989).
C.M. Miller, I.E. Anderson, and J.F. Smith, J. Electron. Mater. 23, 595 (1995).
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Liu, P.L., Shang, J.K. Influence of microstructure on fatigue crack growth behavior of Sn-Ag solder interfaces. J. Electron. Mater. 29, 622–627 (2000). https://doi.org/10.1007/s11664-000-0056-x
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DOI: https://doi.org/10.1007/s11664-000-0056-x