Abstract
In this study, the commercially pure titanium was successfully electrochemical borided in a borax-based electrolyte. The process was carried out at a constant cathodic current density of 300 mA cm−2 and at temperatures of 1123 K and 1223 K (850 °C and 950 °C) for 0.5, 1, 2, 3, and 5 hours. The growth behavior of titanium boride layers in the α phase field of titanium was compared with that in the β phase field. After boriding, the presence of both the TiB2 top layer and TiB whisker sub-layer was confirmed by the X-ray diffraction (XRD) and scanning electron microscope. The relationship between the thickness of boride layers and boriding time was found to have a parabolic character in both α and β phase fields of titanium. The TiB whiskers showed ultra-fast growth rate in the β phase field. Its growth rate constant was found to be as high as 3.2002 × 10−13 m2 s−1. Besides, the chemical resistance of the TiB2 layer on the surface of titanium substrate was characterized by immersion tests in molten aluminum.
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The authors thank the financial support of the National Science & Technology Pillar Program of China (2012BAE08B02).
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Manuscript submitted November 19, 2015.
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Lv, X., Hu, L., Shuang, Y. et al. The Growth Behavior of Titanium Boride Layers in α and β Phase Fields of Titanium. Metall Mater Trans A 47, 3573–3579 (2016). https://doi.org/10.1007/s11661-016-3510-y
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DOI: https://doi.org/10.1007/s11661-016-3510-y