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Surface Roughness and Structure of Electrodeposited Cu2O Layers on Si Substrates

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Abstract

Cu2O thin films were electrodeposited on n-Si (100) and p-Si (111) substrates, and characterized by X-ray diffraction, atomic force microscopy, transmission electron microscopy and optical reflectance measurements. The results showed Cu2O deposits with low surface roughness that increase continuously with the thickness. The grains are columnar with cone-shape and texture that follows the orientation of the substrate. The optical gap and the refraction index were also dependent on the texture of the layers.

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Acknowledgments

The authors wish to acknowledge the Brazilian agencies CAPES (PRODOC and Pro-equipamentos), CNPQ, CNPQ/NAMITEC, FINEP/CT-INFRA, and FAPESC that supported this research and the measurements at labs LCME (TEM) and LDRX (XRD).

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Authors and Affiliations

  1. Laboratório de Filmes Finos e Superfícies, Departamento de Física, Universidade Federal de Santa Catarina, Caixa Postal 476, Florianópolis, 88.040-900, Brazil

    Iuri Stefani Brandt, Vagner Stenger, Vinicius Cláudio Zoldan, Alexandre Da Cas Viegas & André Avelino Pasa

  2. Laboratório Central de Microscopia Eletrônica, Universidade Federal de Santa Catarina, Caixa Postal 476, Florianópolis, 88.040-900, Brazil

    José Javier Saéz Acuña

  3. Departamento de Física, Universidade Federal de Pelotas, Caixa Postal 354, Pelotas, 96010-900, Brazil

    Douglas Langie da Silva

Authors
  1. Iuri Stefani Brandt
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  2. Vagner Stenger
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  3. Vinicius Cláudio Zoldan
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  4. José Javier Saéz Acuña
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  5. Douglas Langie da Silva
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  6. Alexandre Da Cas Viegas
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  7. André Avelino Pasa
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Correspondence to André Avelino Pasa.

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Brandt, I.S., Stenger, V., Zoldan, V.C. et al. Surface Roughness and Structure of Electrodeposited Cu2O Layers on Si Substrates. Top Catal 54, 97–100 (2011). https://doi.org/10.1007/s11244-011-9629-6

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  • DOI: https://doi.org/10.1007/s11244-011-9629-6

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