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Special Features of Admittance in Mis Structures Based on Graded-Gap MBE n-Hg1–x Cd x Te (x = 0.31–0.32) in a Temperature Range OF 8–300 K

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Admittance of MIS structures based on graded-gap n-Hg1–х Cd х Te (x = 0.31–0.32) grown by molecular beam epitaxy (MBE) is investigated in a wide temperature range (8–300 K). It is shown that the temperature and frequency dependences of the differential resistance of space charge region for structures with a graded-gap layer are qualitatively similar to those for structures without a graded-gap layer. It is found that for MIS structures based on MBE n-Hg1–х Cd х Te (x = 0.31–0.32), regardless of the presence of a graded-gap layer, the differential resistance of space charge region is limited by the processes of Shockley-Read generation in the temperature range of 25–100 K.

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Correspondence to A. V. Voitsekhovskii.

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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 5, pp. 62–69, May, 2014.

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Voitsekhovskii, A.V., Nesmelov, S.N., Dzyadukh, S.М. et al. Special Features of Admittance in Mis Structures Based on Graded-Gap MBE n-Hg1–x Cd x Te (x = 0.31–0.32) in a Temperature Range OF 8–300 K. Russ Phys J 57, 633–641 (2014). https://doi.org/10.1007/s11182-014-0286-7

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  • DOI: https://doi.org/10.1007/s11182-014-0286-7

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