Skip to main content
SpringerLink
Log in

Novel Electroless Deposition of Cu3Se2 Film on Silicon Substrate by a Simple Galvanic Displacement Process

  • Short Communications
  • Published:
Russian Journal of Electrochemistry Aims and scope Submit manuscript

Abstract

A novel electroless deposition method for depositing highly uniform adhesive thin films of copper selenide (Cu3Se2) on silicon substrates from aqueous solutions is described. The deposition is carried out by two coupled galvanic reactions in a single deposition bath containing copper cations, hydrogen fluoride, and selenous acid: the galvanic deposition of copper on silicon and the subsequent galvanic reaction between the deposited copper with selenous acid in the deposition bath. The powder X-ray diffraction and scanning electron microscopy are used to characterize and examine the deposited films.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

REFERENCES

  1. Haram, S.K., Santhanam, K.S.V., Neumann-Spallart, M. and Levy-Clement, C., Mater. Res. Bull., 1992, vol. 27, p. 1185.

    Article  CAS  Google Scholar 

  2. Padam, G.K., Thin Solid Films, 1987, vol. 150, p. L89.

    Article  CAS  ISI  Google Scholar 

  3. Levy-Clement, C., Neumann-Spallart, M., Haram, S.K. and Santhanam, K.S.V., Thin Solid Films, 1997, vol. 302, p. 12.

    CAS  Google Scholar 

  4. Toneje, A. and Toneje, A.M., J. Solid State Chem., 1981, vol. 39, p. 259.

    Google Scholar 

  5. Shafizade, R.B., Ivanova, I.V. and Kazinets, M.M., Thin Solid Films, 1976, vol. 35, p. 169.

    Article  CAS  ISI  Google Scholar 

  6. Kashida, S. and Akai, J., J. Phys. C: Solid State Phys., 1988, vol. 21, p. 5329.

    Article  CAS  Google Scholar 

  7. Estrada, C.A., Nair, P.K., Nair, M.T.S., Zingaro, R.A., and Meyers, E.A., J. Electrochem. Soc., 1994, vol. 141, p. 802.

    CAS  Google Scholar 

  8. Mondal, A. and Pramanik, P., J. Solid State Chem., 1983, vol. 47, p. 81.

    Article  CAS  Google Scholar 

  9. Mondal, A. and Pramanik, P., J. Solid State Chem., 1984, vol. 55, p. 116.

    Article  CAS  Google Scholar 

  10. Shafizade, R.B., Ivanova, I.V., and Kazinets, M.M., Thin Solid Films, 1978, vol. 55, p. 211.

    Article  CAS  ISI  Google Scholar 

  11. Chen, W.S., Stewart, J.M., Mickelson, R.A., Appl. Phys. Lett., 1985, vol. 46, p. 1095.

    CAS  Google Scholar 

  12. Okimura, H., Matsumae, T., and Makabe, R., Thin Solid Films, 1980, vol. 71, p. 53.

    Article  CAS  ISI  Google Scholar 

  13. Korzhuev, M.A., Phys. Solid State, 1998, vol. 40, p. 217.

    Google Scholar 

  14. Lakshmi, M., Bindu, K., Bini, S., Vijayakumar, K.P., Sudha Kartha C., Abe, T., and Kashiwaba, Y., Thin Solid Films, 2001, vol. 386, p. 127.

    Article  CAS  ISI  Google Scholar 

  15. Baeck, S.H., Choi, K.S., Jaramillo, T.F., Stucky, G.D., and McFarland, E.W., Adv. Mater., 2003, vol. 15, p. 1269.

    Article  CAS  Google Scholar 

  16. Fernando, C.A.N. and Wetthasinghe, S.K., Sol. Energy Mater. Sol. Cells, 2000, vol. 63, p. 299.

    CAS  Google Scholar 

  17. Peng, K.Q. and Zhu, J., Electrochimica Acta, 2004, vol. 49, p. 2563.

    CAS  ISI  Google Scholar 

  18. Iacovangelo, C.D. and Zarnoch, K.P., J. Electrochem. Soc., 1991, vol. 138, p. 983.

    CAS  Google Scholar 

  19. Lee, M.K., Wang, J.J. and Wang, H.D., J. Electrochem. Soc., 1997, vol. 144, p. 1777.

    CAS  Google Scholar 

  20. Kato, M., Sato, J., Otani, H., Homma, T., Okinaka, Y., Osaka, T., and Yoshioka, O., J. Electrochem. Soc., 2002, vol. 149, p. C164.

    Article  CAS  Google Scholar 

  21. Poter, L.A.J., Choi, H.C., Ribbe, A.E., and Buriak, J.M., Nano Lett., 2002, vol. 2, p. 1067.

    Google Scholar 

  22. O'Brien, R.N. and Santhanam, K.S.V., J. Electrochem. Soc., 1992, vol. 139, p. 434.

    Google Scholar 

  23. Balashova, N.A., Eletskii, V.V., and Medyntsev, V.V., Elektrokhimiya, 1965, vol. 1, p. 274.

    CAS  Google Scholar 

  24. Haram, S.K. and Santhanam, K.S.V., Mater. Res. Bull., 1992, vol. 27, p. 1185.

    Article  CAS  Google Scholar 

  25. Kazacos, M.S. and Miller, B., J. Electrochem. Soc., 1980, vol. 127, p. 869.

    CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Zhuzhou Institute of Technology, Zhuzhou, Hunan Province, 412000, P.R. China

    Y. J. Yang & L. Y. He

Authors
  1. Y. J. Yang
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. L. Y. He
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Y. J. Yang.

Additional information

__________

From Elektrokhimiya, Vol. 41, No. 11, 2005, pp. 1391–1394.

Original English Text Copyright © 2005 by Yang, He.

The text was submitted by the authors in English.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Yang, Y.J., He, L.Y. Novel Electroless Deposition of Cu3Se2 Film on Silicon Substrate by a Simple Galvanic Displacement Process. Russ J Electrochem 41, 1241–1243 (2005). https://doi.org/10.1007/s11175-005-0209-6

Download citation

  • Received:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11175-005-0209-6

Key words

Search

Navigation