Abstract
The effect of Si and Y2O3 additions on the oxidation behavior of Ni–xAl (x = 5 or 10 wt%) alloys at 1150 °C was studied. The addition of Y2O3 accelerates oxidation rate of alloys, especially growth rate of NiO, but improves adherence of the scale to the substrate. The addition of Si facilitates the selective oxidation of Al, suppresses the formation of NiO and therefore reduces the critical Al content to form continuous layer of alumina scale. Higher Al content decreases the oxidation rate of alloys in binary Ni–Al alloys and increases the oxidation rate of alloys in ternary Ni–Al–Si alloys. The effect of third-element Si is more significant and beneficial than that of Al content in ternary Ni–Al–Si alloys.
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Acknowledgements
A portion of this research was sponsored by Natural Science Foundation of Guangxi (No. 2015GXNSFAA139252) and National Nature Science Foundation of China (No. 51371059) and Natural Science Foundation of Guangxi (No. 2014GXNSFCA118013). A portion of this work was performed at the National High Magnetic Field Laboratory (NHMFL), which is supported by National Science Foundation Cooperative Agreement No. DMR-1157490 and the State of Florida.
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Li, W., Han, K., Niu, R. et al. Effect of Si and Y2O3 Additions on the Oxidation Behavior of Ni–xAl (x = 5 or 10 wt%) Alloys at 1150 °C. Oxid Met 89, 731–753 (2018). https://doi.org/10.1007/s11085-017-9814-5
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DOI: https://doi.org/10.1007/s11085-017-9814-5