Abstract
Ti–O nanoparticles have been synthesized via hollow cathode sputtering in an Ar–O2 atmosphere using high power pulsing. It is shown that the stoichiometry and the size of the nanoparticles can be varied independently, the former through controlling the O2 gas flow and the latter by the independent biasing of two separate anodes in the growth zone. Nanoparticles with diameters in the range of 25–75 nm, and with different Ti–O compositions and crystalline phases, have been synthesized.
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Ahadi AM, Zaporojtchenko V, Peter T et al (2013) Role of oxygen admixture in stabilizing TiO x nanoparticle deposition from a gas aggregation source. J Nanopart Res 15:2125. doi:10.1007/s11051-013-2125-0
Berg S, Nyberg T (2005) Fundamental understanding and modeling of reactive sputtering processes. Thin Solid Films 476:215–230. doi:10.1016/j.tsf.2004.10.051
Chen X, Mao SS (2007) Titanium dioxide nanomaterials: synthesis, properties, modifications, and applications. Chem Rev 107:2891–2959. doi:10.1021/cr0500535
Clavero C, Slack JL, Anders A (2013) Size and composition-controlled fabrication of thermochromic metal oxide nanocrystals. J Phys D Appl Phys 46:362001. doi:10.1088/0022-3727/46/36/362001
Delahoy AE, Guo SY, Paduraru C, Belkind A (2004) Reactive-environment, hollow cathode sputtering: basic characteristics and application to Al2O3, doped ZnO, and In2O3:Mo. J Vac Sci Technol, A 22:1697. doi:10.1116/1.1723289
Dreesen L, Cecchet F, Lucas S (2009) DC magnetron sputtering deposition of titanium oxide nanoparticles: influence of temperature, pressure and deposition time on the deposited layer morphology, the wetting and optical surface properties. Plasma Process Polym 6:S849–S854. doi:10.1002/ppap.200932201
Hasan MI, Pilch I, Söderström D et al (2013) Modeling the extraction of sputtered metal from high power impulse hollow cathode discharges. Plasma Sources Sci Technol 22:035006. doi:10.1088/0963-0252/22/3/035006
Hubička Z, Kment Š, Olejníček J et al (2013) Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system. Thin Solid Films 549:184–191. doi:10.1016/j.tsf.2013.09.031
Jung Th, Kälber T, Heide Vvd (1996) Gas flow sputtering of oxide coatings: practical aspects of the process. Surf Coat Technol 86–87:218–224. doi:10.1016/S0257-8972(96)03043-5
Kubo Y, Iwabuchi Y, Yoshikawa M et al (2008) High rate deposition of photocatalytic TiO2 films with high activity by hollow cathode gas-flow sputtering method. J Vac Sci Technol, A 26:893–897. doi:10.1116/1.2836425
Lapostolle FU, Billard A, Von Stebut J (2000) Structure/mechanical properties relationship of titanium-oxygen coatings reactively sputter-deposited. Surf Coat Technol 135:1–7. doi:10.1016/S0257-8972(00)00721-0
Marek A, Valter J, Kadlec S, Vyskočil J (2011) Gas aggregation nanocluster source—reactive sputter deposition of copper and titanium nanoclusters. Surf Coat Technol 205:S573–S576. doi:10.1016/j.surfcoat.2010.12.027
Nyberg T, Berg S, Helmersson U, Hartig K (2005) Eliminating the hysteresis effect for reactive sputtering processes. Appl Phys Lett 86:164106. doi:10.1063/1.1906333
Peter T, Polonskyi O, Gojdka B et al (2012) Influence of reactive gas admixture on transition metal cluster nucleation in a gas aggregation cluster source. J Appl Phys 112:114321. doi:10.1063/1.4768528
Pilch I, Söderström D, Brenning N, Helmersson U (2013a) Size-controlled growth of nanoparticles in a highly ionized pulsed plasma. Appl Phys Lett 102:033108. doi:10.1063/1.4788739
Pilch I, Söderström D, Hasan MI et al (2013b) Fast growth of nanoparticles in a hollow cathode plasma through orbit motion limited ion collection. Appl Phys Lett 103:193108. doi:10.1063/1.4828883
Polonskyi O, Peter T, Mohammad Ahadi A et al (2013) Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture. Appl Phys Lett 103:033118. doi:10.1063/1.4816036
Safi I (2000) Recent aspects concerning DC reactive magnetron sputtering of thin films : a review. Surf Coatings Technol 127:203–219. doi:10.1016/S0257-8972(00)00566-1
Sproul WD, Christie DJ, Carter DC (2005) Control of reactive sputtering processes. Thin Solid Films 491:1–17. doi:10.1016/j.tsf.2005.05.022
Wallin E, Helmersson U (2008) Hysteresis-free reactive high power impulse magnetron sputtering. Thin Solid Films 516:6398–6401. doi:10.1016/j.tsf.2007.08.123
Acknowledgments
This work has been financially supported by the Knut and Alice Wallenberg foundation (KAW 2014.0276) and the Swedish Research Council under Grant No. 2008-6572 via the Linköping Linneaus Environment LiLi-NFM. We like to thank Petter Larsson for designing key electronics used in this work and Daniel Magnfält for helping with the XRD characterization and discussions. We also would like to thank Joseph E. Greene, Ivan Petrov, and Nils Brenning for important suggestions.
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Ulf Helmersson is co-founder of TiÅ AB, a company with an aim to exploit research results generated from NP-synthesis activities such as this study.
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The other authors declare no competing financial interests.
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Gunnarsson, R., Helmersson, U. & Pilch, I. Synthesis of titanium-oxide nanoparticles with size and stoichiometry control. J Nanopart Res 17, 353 (2015). https://doi.org/10.1007/s11051-015-3158-3
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DOI: https://doi.org/10.1007/s11051-015-3158-3