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Nanosphere dispersion on a large glass substrate by low dose ion implantation for localized surface plasmon resonance

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Abstract

Dispersing nanospheres on a large glass substrate is the key to fabricate noble metal nanostructures for localized surface plasmon resonance through dispersed nanosphere lithography. This article reports that by modifying the glass surface with low dose ion implantation and successively dip coating the surface with poly(diallyldimethyl ammonium chloride) (PDDA), polystyrene or silica nanospheres can be dispersed on a large glass substrate. Investigation shows that several kinds of ions, such as silicon, boron, argon, and arsenic, can improve the nanosphere dispersion on glass, attributed to the ion bombardment-caused silicon increment. Ion implantation imposes no surface roughness or optical loss to the glass substrate, thus this method is suitable for localized surface plasmon resonance application. Experiments show silicon ion implantation can best disperse the nanospheres. For the gold nanostructures obtained by obliquely evaporating 30 nm of gold film onto the polystyrene nanospheres, which are dispersed on a silicon ion implanted glass substrate, a localized surface plasmon resonance sensitivity of 242 nm/RIU is achieved.

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Acknowledgments

The authors would like to acknowledge the Institute of Materials Research and Engineering (IMRE), A*STAR, Singapore for its financial support of the projects IMRE/06-1R0320 and IMRE/09-1C0420, and Science & Engineering Research Council (SERC), A*STAR for the support of the project 102 152 0014. The authors are indebted to Dr. Debbie SENG Hwee Leng in SERC nanofabrication & characterization (SNFC) for conducting the SIMS measurements, and Dr. PAN Ji Sheng in IMRE for providing the XPS-sputtered samples and carrying out the XPS measurements.

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Correspondence to Xiaodong Zhou.

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Zhou, X., Liu, K.Y., Zhang, N. et al. Nanosphere dispersion on a large glass substrate by low dose ion implantation for localized surface plasmon resonance. J Nanopart Res 13, 2919–2927 (2011). https://doi.org/10.1007/s11051-010-0182-1

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  • DOI: https://doi.org/10.1007/s11051-010-0182-1

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