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Effect of Li- and Ta-doping on the ferroelectric properties of Na0.5K0.5NbO3 thin films prepared by a chelate route

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Abstract

The effects of lithium and tantalum doping on the properties of Na0.5K0.5NbO3 (NKN) thin films were investigated. The films were fabricated by an optimized chelate route which offers the advantage of a simple and rapid solution synthesis. The optimization was achieved by investigating the effects of alkaline volatilization loss on film properties. In this way, undoped NKN thin films fabricated by this conventional method exhibited good ferroelectric properties (Pr ~ 8 μC/cm2, and Ec ~ 55 kV/cm for films annealed at 650 °C). The developed chelate route was then used to grow Li (5 %) and Ta (10 %) substituted thin films. Such structures allowed us to compare the effect of these dopant cations on phase formation, microstructure and ferroelectric properties. We show that both modifications produced a remarkable improvement on the ferroelectricity of the films. While the undoped material exhibited large leakage components in films annealed at 600 °C, films modified with Li or Ta presented well saturated ferroelectric hysteresis loops, indicating that those ions have a significant influence on the conducting process. The remnant polarizations of the Ta-doped films are greater than those of the Li-doped samples. This feature is however reversed for films annealed at low temperature (600 °C) due to the presence of a non-ferroelectric secondary phase in the Ta-doped composition.

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Acknowledgments

The authors wish to acknowledge financial support from Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET) and Universidad Nacional de Rosario. M.G.S. thanks support from CIUNR.

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Authors and Affiliations

  1. Laboratorio de Materiales Cerámicos, Universidad Nacional de Rosario, IFIR, CONICET, Av. Pellegrini 250, S2000BTP, Rosario, Argentina

    A. Fernández Solarte, N. Pellegri & O. de Sanctis

  2. Instituto de Física Rosario, Universidad Nacional de Rosario, 27 de Febrero 210 Bis (2000), Rosario, Argentina

    M. G. Stachiotti

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  1. A. Fernández Solarte
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  2. N. Pellegri
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  3. O. de Sanctis
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  4. M. G. Stachiotti
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Correspondence to M. G. Stachiotti.

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Solarte, A.F., Pellegri, N., de Sanctis, O. et al. Effect of Li- and Ta-doping on the ferroelectric properties of Na0.5K0.5NbO3 thin films prepared by a chelate route. J Sol-Gel Sci Technol 66, 488–496 (2013). https://doi.org/10.1007/s10971-013-3036-3

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  • DOI: https://doi.org/10.1007/s10971-013-3036-3

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