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Nanoporous morphology of alumina films prepared by sol–gel dip coating method on alumina substrate

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Abstract

Nanoporous crack free alumina thin films were fabricated in two phases gamma (γ) and alpha (α) by sol–gel dip coating method. The thickness of the mesoporous films was increased with binder by varying its concentration, and with increasing the number of coating. The porosity, pore size, surface area and phase were controlled by sintering temperature. Interconnected pore structure of 8–15 nm diameter were successfully prepared by repeating the deposition several times. FESEM, BET, AFM and XRD techniques were employed for the microstructural characterization.

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Authors and Affiliations

  1. Nano-Sensor Research Laboratory, F/O Engineering and Technology, Jamia Millia Islamia (Central University), New Delhi, India

    Manju Pandey, Kriti Tyagi, Prabhash Mishra, K. Sengupta & S. S. Islam

  2. Sensors and Actuators Division, Central Glass and Ceramic Research Institute, 196 Raja S. C. Mullick Road, Kolkata, 700032, India

    Debdulal Saha

Authors
  1. Manju Pandey
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  2. Kriti Tyagi
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  3. Prabhash Mishra
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  4. Debdulal Saha
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  5. K. Sengupta
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  6. S. S. Islam
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Correspondence to S. S. Islam.

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Pandey, M., Tyagi, K., Mishra, P. et al. Nanoporous morphology of alumina films prepared by sol–gel dip coating method on alumina substrate. J Sol-Gel Sci Technol 64, 282–288 (2012). https://doi.org/10.1007/s10971-012-2855-y

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  • DOI: https://doi.org/10.1007/s10971-012-2855-y

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