Skip to main content
Log in

The effects of preparation temperature on the main electrical parameters of Al/TiO2/p-Si (MIS) structures by using sol–gel method

  • Original Paper
  • Published:
Journal of Sol-Gel Science and Technology Aims and scope Submit manuscript

Abstract

In this study, the forward bias current–voltage (I–V) and capacitance–voltage (C–V) characteristics of the Al/TiO2/p-Si (MIS) structures derived using the sol–gel method have been investigated and compared at various preparation temperatures. Experimental results show that the preparation temperatures strongly affect the electrical characteristics, such as ideality factor (n), zero-bias barrier height (\( \phi_{b0} \)), series resistance (R s ) and interface states (N ss ). The MIS structures show non-ideal behavior of I–V characteristics with an n varying between 2.17 and 4.61. We have found that the \( \phi_{b0} \) and R s increase as the n decrease with increasing preparation temperature. The energy distribution profile of N ss of the Al/TiO2/p-Si (MIS) structures was obtained from the forward bias I–V characteristics by taking into account both the bias dependence of the effective barrier height (\( \phi_{e} \)) and R s for various preparation temperatures. The values of N ss increase from the midgap towards the top of valance band for various preparation temperatures.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6

Similar content being viewed by others

References

  1. Sze SM, Ng Kwok K (2007) Physics of semiconductor devices, 3nd edn. John Wiley, New Jersey

  2. Rhoderick EH, Williams RH (1978) Metal-semiconductor contacts, 2nd edn. Clarendon Press, Oxford

  3. Card HC, Rhoderick EH (1971) J Phys D 4:1589

    Article  CAS  Google Scholar 

  4. Karataş Ş, Altındal Ş, Türüt A, Özmen A (2003) Appl Surf Sci 217:250. doi:10.1016/S0169-4332(03)00564-6

    Article  ADS  Google Scholar 

  5. Zeyrek S, Altındal Ş, Yüzer H, Bülbül MM (2006) Appl Surf Sci 252:2999. doi:10.1016/j.apsusc.2005.05.008

    Article  ADS  CAS  Google Scholar 

  6. Sullivan JP, Tung RT, Pinto MR, Graham WR (1991) J Appl Phys 70:7403. doi:10.1063/1.349737

    Article  ADS  CAS  Google Scholar 

  7. Dökme İ, Altındal Ş (2006) Semicond Sci Technol 21:1053. doi:10.1088/0268-1242/21/8/012

    Article  Google Scholar 

  8. Zhu S, Van Meirhaeghe RL, Detavernier C, Cardon F, Ru G, Qu X, Li B (2000) Solid-State Electron 44:663. doi:10.1016/S0038-1101(99)00268-3

    Article  ADS  CAS  Google Scholar 

  9. Tekeli Z, Altındal Ş, Çakmak M, Ozçelik S, Ozbay E (2007) J Appl Phys 102:054510. doi:10.1063/1.2777881

    Article  ADS  Google Scholar 

  10. Cheung SK, Cheung NW (1986) Appl Phys Lett 49:85. doi:10.1063/1.97359

    Article  ADS  CAS  Google Scholar 

  11. Singh A, Reinhardt KC, Anderson WA (1990) J Appl Phys 68:3478

    ADS  Google Scholar 

  12. Hudait MK, Krupanidhi SB (2001) Mater Sci Eng B 87:141. doi:10.1016/S0921-5107(01)00713-9

    Article  Google Scholar 

  13. Hudait MK, Venkateswarlu P, Krupanidhi SB (2001) Solid-State Electron 45:1332. doi:10.1016/S0038-1101(00)00230-6

    Article  Google Scholar 

  14. Crowell CR, Sze SM (1965) J Appl Phys 36:3212. doi:10.1063/1.1713959

    Article  ADS  Google Scholar 

  15. Chattopadhyay P, Raychaudhuri B (1993) Solid-State Electron 35:605. doi:10.1016/0038-1101(93)90272-R

    Article  Google Scholar 

  16. Akkal B, Benemara Z, Boudissa A, Bouiadjra NB, Amrani M, Bideux L, Gruzza B (1998) Mater Sci Eng B 55:162. doi:10.1016/S0921-5107(98)00168-8

    Article  Google Scholar 

  17. Çetinkara HA, Türüt A, Zengin DM, Erel Ş (2003) Appl Surf Sci 207:190. doi:10.1016/S0169-4332(02)01323-5

    Article  Google Scholar 

  18. Dökme İ, Altındal Ş (2007) Physica B 393:328. doi:10.1016/j.physb.2007.01.020

    Article  Google Scholar 

  19. Nicollian EH, Brews JR (1982) Metal-oxide semiconductor (mos) physics and technology. Wiley, New York

    Google Scholar 

  20. Tataroğlu A, Altındal Ş (2006) Microelectron Eng 83:582. doi:10.1016/j.mee.2005.12.014

    Article  Google Scholar 

  21. Chakraborty S, Bera MK, Bose PK, Maiti CK (2006) Semicond Sci Technol 21:335. doi:10.1088/0268-1242/21/3/022

    Article  ADS  CAS  Google Scholar 

  22. Yang L, Scott Saavedra S, Armstrong NR, Hayes J (1994) Anal Chem 66:1254. doi:10.1021/ac00080a010

    Article  PubMed  CAS  Google Scholar 

  23. Choi Y, Yamamoto S, Umebayashi T, Yoshikawa M (2004) Solid State Ion 172:105–108. doi:10.1016/j.ssi.2004.03.014

    Article  CAS  Google Scholar 

  24. Czapla A, Kusior E, Bucko M (1989) Thin Solid Films 182:15. doi:10.1016/0040-6090(89)90239-3

    Article  ADS  CAS  Google Scholar 

  25. Sanon G, Rup R, Mansingh A (1990) Thin Solid Films 190:287. doi:10.1016/0040-6090(89)90918-8

    Article  CAS  Google Scholar 

  26. Ha HY, Nam SW, Lim TH, Oh IH, Hong SA (1996) J Membr Sci 111:81. doi:10.1016/0376-7388(95)00278-2

    Article  CAS  Google Scholar 

  27. Alam MJ, Cameron DC (2002) Sol-Gel Sci J Tech 25:137

    Article  CAS  Google Scholar 

  28. Wen T, Gao J, Shen J (2001) J Mater Sci 36:5923. doi:10.1023/A:1012989012840

    Article  CAS  Google Scholar 

  29. Werner JH, Güttler HH (1991) J Appl Phys 69:1522. doi:10.1063/1.347243

    Article  ADS  CAS  Google Scholar 

  30. Kern W (1993) Handbook of semiconductor cleaning technology. Noyes, New York

    Google Scholar 

  31. Clark RJH (1968) An introduction to the chemistry of the early transition elements. Elsevier, New York

    Google Scholar 

  32. Yang W, Marino J, Monson A, Wolden CA (2006) Semicond Sci Technol 21:1573. doi:10.1088/0268-1242/21/12/012

    Article  ADS  CAS  Google Scholar 

Download references

Acknowledgment

This work was supported by Ankara University (BIYEP) Project number 2005-K–120-140-8 and Ankara University Scientific Research Project (BAP), 2007-07-45-054.

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to O. Pakma.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Pakma, O., Serin, N., Serin, T. et al. The effects of preparation temperature on the main electrical parameters of Al/TiO2/p-Si (MIS) structures by using sol–gel method. J Sol-Gel Sci Technol 50, 28–34 (2009). https://doi.org/10.1007/s10971-009-1895-4

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10971-009-1895-4

Keywords

Navigation