Abstract
SiO2-ZrO2 based nanostructured multilayers films have been prepared by sol–gel processing from metallorganic precursors by low temperature inorganic polymerization reactions. Simultaneous gelation of both precursors was realized. Homogeneous and transparent films were obtained at room temperature by dip- and spin-coating on glass and silicon wafer substrates. Samples with successively deposited layers (1–3 layers) and successive thermal treatments have been also studied. Each deposited layer was thermally treated for 1 h at 300°C. The coatings were characterized by XRD, spectroellipsometry (SE), UV-VIS spectroscopy and AFM methods. The influence of substrates, number of coatings and number of thermal treatments on the optical and structural properties of the films was established. The thickness of three deposited SiO2-ZrO2 layers is about 496 nm on glass substrates and 413 nm on the silicon wafer substrate. The films deposited on glass are more porous than those deposited on silicon. The properties of optical waveguide prepared from SiO2-ZrO2 layers on silicon substrates will be discussed.
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Crisan, M., Gartner, M., Predoana, L. et al. Sol–Gel SiO2-ZrO2 Coatings for Optical Applications. J Sol-Gel Sci Technol 32, 167–172 (2004). https://doi.org/10.1007/s10971-004-5783-7
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DOI: https://doi.org/10.1007/s10971-004-5783-7