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Towards β-phase formation probability in spin coated PVDF thin films

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Abstract

This work aimed towards the study on variations in the percentage of β-phase in Poly vinylidene fluoride (PVDF) thin films deposited by spin coating technique. PVDF is a semi-crystalline polymer which exhibits α, β, γ and δ polymorphs. Among these polymorphs, generally it crystallizes in a non-polar α-phase, which is of little importance as far as its applications are concerned. However, the β-phase, which exhibits spontaneous polarity created tremendous interest and showed a path towards the devices based on its pyro- and piezoelectric properties. Fourier Transform Infrared (FTIR) spectroscopy and XRD techniques were used to study the percentage of formation of β-phase in spin coated PVDF thin films at different processing conditions viz. spin rotation speed (rpm), solution concentration and annealing temperature. We identified the β-phase percentage in PVDF thin films, which are (i) Deposited with different rotation speeds ranging from 1000 to 9000 rpm, (ii) Annealed at different temperatures viz.; room temperature to 100C, and (iii) Deposited at various solution concentrations. It is identified that percentage of formation of β-phase is high in the films deposited with 15(w/v)% solution concentration which is annealed at 100C. The films deposited at higher rpm is showing low enhancement in the β-phase with annealing temperature.

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Acknowledgements

This work has been carried out from the grants provided by Vision Group on Science and Technology (VGST), Govt. of Karnataka-560001.

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Authors and Affiliations

  1. Centre for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    Habibuddin Shaik, S. N. Rachith & K. J. Rudresh

  2. Department of Mechanical Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    S. N. Rachith

  3. Department of Electronics & Communication Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    K. J. Rudresh

  4. Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    Abdul Sattar Sheik

  5. Plasma Processing Laboratory, Department of Instrumentation and Applied Physics, Indian Institute of Science, Banglore, 560012, India

    K. H. Thulasi Raman, P. Kondaiah & G. Mohan Rao

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  1. Habibuddin Shaik
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  2. S. N. Rachith
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  3. K. J. Rudresh
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  4. Abdul Sattar Sheik
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  5. K. H. Thulasi Raman
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  6. P. Kondaiah
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  7. G. Mohan Rao
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Correspondence to Habibuddin Shaik.

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Shaik, H., Rachith, S.N., Rudresh, K.J. et al. Towards β-phase formation probability in spin coated PVDF thin films. J Polym Res 24, 35 (2017). https://doi.org/10.1007/s10965-017-1191-x

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  • DOI: https://doi.org/10.1007/s10965-017-1191-x

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