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Atomic layer deposition of TiO2 film on a polyethersulfone membrane: separation applications

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Abstract

In the current study, a titanium dioxide (TiO2) nanostructured film was grown on a polyethersulfone (PES) substrate membrane using atomic layer deposition (ALD) with the aim of tailoring the membrane surface properties to be suitable for desalination applications. Scanning electron microscopy (SEM), atomic force microscopy (AFM), contact angle (CA) and zeta potential measurements and a tensile meter were used to characterize the membrane morphology, surface properties and mechanical stability, respectively. In addition, the separation performance of all of the prepared membranes was evaluated in terms of water flux and salt rejection. The results showed that the TiO2 nanostructured film deposited-PES membrane exhibited excellent performance with a rejection of ≥90 % at room temperature for NaCl, which is four times greater than that of a PES membrane alone. It is interesting to note that the deposition of the TiO2 film resulted in a marginal decrease in the water flux from 60 ± 2 Lm−2 h−1 to 47 ± 2 Lm−2 h−1 of the resulting membrane due to the TiO2 film’s nanometre-scale thickness. Moreover, the ALD of the TiO2 film enhanced the mechanical strength of the membrane as it tightly wrapped the skeleton of the membrane.

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Acknowledgments

The authors are thankful to the financial support from the King Abdullah Institute for Nanotechnology, Deanship of Scientific Research, King Saud University; Riyadh, Saudi Arabia.

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Authors and Affiliations

  1. King Abdullah Institute for Nanotechnology, King Saud University, P.O. Box- 2455, Riyadh, 11451, Kingdom of Saudi Arabia

    Javed Alam, Mansour Alhoshan, Lawrence Arockiasamy Dass, Arun Kumar Shukla & M. R. Muthumareeswaran

  2. Chemical Engineering Department, College of Engineering, King Saud University, P.O. Box 800, Riyadh, 11421, Kingdom of Saudi Arabia

    Mansour Alhoshan

  3. Department of Physics & Astronomy, College of Science, King Saud University, P.O. 2454, Riyadh, 11541, Saudi Arabia

    Mukhtar Hussain & Abdullah S. Aldwayyan

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  1. Javed Alam
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  2. Mansour Alhoshan
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Correspondence to Javed Alam.

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Alam, J., Alhoshan, M., Dass, L.A. et al. Atomic layer deposition of TiO2 film on a polyethersulfone membrane: separation applications. J Polym Res 23, 183 (2016). https://doi.org/10.1007/s10965-016-1063-9

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  • DOI: https://doi.org/10.1007/s10965-016-1063-9

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