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Oxidation mode on charge transfer mechanism in formation of Mn–Co–Ni–O spinel films by RF sputtering

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Abstract

Series of negative temperature coefficient Mn–Co–Ni–O spinel oxide thin films were successfully prepared on thermally oxidized SiO2/Si (100) substrates by RF sputtering a Mn–Co–Ni metal alloy target with the sputtering gas of different Ar:O2 partial pressure ratios. The crystallinity of the spinel films was improved as O2 contents increased. The film conductivity was reduced. The minute variation in an optical absorption peak at around 1.7 eV by spectroscopic ellipsometry may be ascribed to the different charge transfer mechanism between Co2+ in tetragonal and Co3+ in octahedral or between O2− and Mn4+ in octahedral sites. Raman and XPS results provided further evidences.

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Acknowledgements

This work was supported by the Thousand Youth Talents Plan (Y42H831301), the National Natural Science Foundation of China (61504168), West Light Foundation of the Chinese Academy of Sciences (XBBS-2014-04), and the Foundation of Director of Xinjiang Technical Institute of Physics & Chemistry, CAS (2015RC010).

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Authors and Affiliations

  1. Key Laboratory of Functional Materials and Devices for Special Environments of CAS, Xinjiang Key Laboratory of Electronic Information Materials and Devices, Xinjiang Technical Institute of Physics & Chemistry, CAS, Urumqi, 830011, China

    Qin Shi, Wei Ren, Wenwen Kong, Lei Wang, Jinbao Xu & Aimin Chang

  2. Department of Physics, Shihezi University, Shihezi, 832003, China

    Qin Shi

  3. College of Electronic Engineering, Chengdu Technological University, Chengdu, 611730, China

    Chao Ma

  4. Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, VA, 23529, USA

    Wei Ren & Chunqi Jiang

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  1. Qin Shi
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  2. Wei Ren
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  3. Wenwen Kong
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  5. Chao Ma
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Correspondence to Wei Ren, Wenwen Kong or Aimin Chang.

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Shi, Q., Ren, W., Kong, W. et al. Oxidation mode on charge transfer mechanism in formation of Mn–Co–Ni–O spinel films by RF sputtering. J Mater Sci: Mater Electron 28, 13659–13664 (2017). https://doi.org/10.1007/s10854-017-7208-8

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  • DOI: https://doi.org/10.1007/s10854-017-7208-8

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