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Effect of manganese concentration on physical properties of ZnS:Mn thin films prepared by chemical bath deposition

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Abstract

ZnS:Mn thin films were grown by chemical bath deposition technique on glass substrates for different doping ratios y = [Mn2+]/[Zn2+] (y = 0, 6, 12 and 18 at. %). Structural, morphological, optical and electrical properties were studied by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), UV–Vis–NIR spectrophotometry, spectrofluorimetry, Hall effect measurement. In fact, the XRD analysis showed that ZnS:Mn films were poorly crystalline. The average transmittance of all films was greater than 70 % in the visible range. The effect of Mn doping on refractive index, extinction coefficient and other optical parameters was also investigated. Measured electrical resistivity decreased slightly from 7.586 × 104 to 6.819 × 104 Ω cm with increasing of doping concentration from 0 to 6 at. % then it increased again to achieve 16.73 × 104 Ω cm for \(y\) equals to 18 at. %.

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Jrad, A., Naffouti, W., Ben Nasr, T. et al. Effect of manganese concentration on physical properties of ZnS:Mn thin films prepared by chemical bath deposition. J Mater Sci: Mater Electron 28, 1463–1471 (2017). https://doi.org/10.1007/s10854-016-5682-z

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  • DOI: https://doi.org/10.1007/s10854-016-5682-z

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