Abstract
Nickel oxide (NiO) thin films have been synthesized by simple and inexpensive chemical bath deposition at low temperature. The synthesized thin films were annealed at 623 K and used for further characterization. Structural and morphological properties of the NiO thin film were characterized using X-ray diffraction and scanning electron microscope (SEM), respectively. The structural study shows the simple cubic formation of NiO thin films with average crystallite size of 9 nm. Honeycomb like surface morphology with porous structure was observed from the SEM study. NiO thin film electrode has been used as a counter electrode in dye sensitized solar cell. Finally, photovoltaic parameters such as short circuit current density (Jsc), open circuit voltage (Voc), Fill Factor (FF) and efficiency (η) have been studied.
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Authors are thankful to Dr. H. M. Pathan for experimental characterisation facilities for J–V curve measurement.
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Yadav, A.T., Magar, P.P., Kadam, V.S. et al. Chemically deposited nickel oxide as counter electrode for dye sensitized solar cell. J Mater Sci: Mater Electron 27, 12297–12301 (2016). https://doi.org/10.1007/s10854-016-5020-5
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DOI: https://doi.org/10.1007/s10854-016-5020-5