Abstract
We report that both low electric resistivity and strong adhesion to polyimide film were attained for a conductive Cu film prepared by low-temperature sintering of 2-amino-1-butanol-protected Cu nanoparticles (AB-Cu NPs) with an average size of 4.4 nm. The sintering temperature of 60 °C for the AB-Cu NPs is the lowest ever reported for Cu NPs. A nanoink comprising these AB-Cu NPs (~35 wt% Cu) produced a conductive Cu film with resistivity of 52 μΩ cm after heating at 150 °C under a nitrogen flow. The adhesion to a polyimide film was compared for films prepared from nanoinks consisting of three different types of alkanol-amine-based Cu NPs: AB-Cu NPs, 1-amino-2-propanol-Cu NPs, and 3-amino-1-propanol-Cu NPs. Only the Cu film prepared from the AB-Cu nanoink established strong adhesion to the substrate without decreasing the electrical conductivity. The adhesiveness is attributed to residual oxidation products after thermal sintering of the Cu nanoinks.
Similar content being viewed by others
References
S. Magdassi, M. Grouchko, A. Kamyshny, Materials 3, 4626 (2010)
K. Tanabe, Mater. Lett. 61, 4573 (2007)
Y. Isomura, T. Narushima, H. Kawasaki, T. Yonezawa, Y. Obora, Chem. Commun. 48, 3784 (2012)
J. Ramyadevi, K. Jeyasubramanian, A. Marikani, G. Rajakumar, A. Rahuman, Mater. Lett. 71, 114 (2012)
V. Abhinav, V.K.R. Rama, K.P. Selvam, S.P. Singh, RSC Adv. 5, 63985 (2015)
C.Y. Lai, C.F. Cheong, J.S. Mandeep, H.B. Abdullah, N. Amin, K.W. Lai, J. Mater. Eng. Perform. 23, 3541 (2014)
Y. Jo, S.J. Oh, S.S. Lee, Y.H. Seo, B.H. Ryu, J. Moon, Y. Choi, S. Jeong, J. Mater. Chem. C 2, 9746 (2014)
M. Hauder, J. Gstöttner, W. Hansch, D. Schmitt-Landsiedel, Appl. Phys. Lett. 78, 838 (2001)
B.K. Park, D. Kim, S. Jeong, J. Moon, J.S. Kim, Thin Solid Films 19, 7706 (2007)
Y. Lee, J.R. Choi, K.J. Lee, N.E. Stott, D. Kim, Nanotechnology 19, 415604 (2008)
N.A. Luechinger, E.K. Athanassiou, W.J. Stark, Nanotechnology 19, 445201 (2008)
H.S. Kim, S.R. Dhage, D.E. Shim, H.T. Hahn, Appl. Phys. A 97, 791 (2009)
J.S. Kang, H.S. Kim, J. Ryu, H.T. Hahn, S. Jang, J.W. Joung, J. Mater. Sci.: Mater. Electron. 21, 1213 (2010)
S. Jang, Y. Seo, J. Choi, T. Kim, J. Cho, S. Kim, D. Kim, Scr. Mater. 62, 258 (2010)
Y. Jianfeng, Z. Guisheng, H. Anming, Y.N. Zhou, J. Mater. Chem. 21, 15981 (2011)
K. Woo, Y. Kim, B. Lee, J. Kim, J. Moon ACS Appl. Mater. Interfaces 3, 2377 (2011)
C.S. Choi, Y.H. Jo, M.G. Kim, H.M. Lee, Nanotechnology 23, 065601 (2012)
C.-J. Wu, S.-M. Chen, Y.-J. Sheng, H.-K. Tsao, J. Taiwan Inst. Chem. Eng. 45, 2719 (2014)
W. Li, M. Chen, Appl. Surf. Sci. 290, 240 (2014)
C.-J. Wu, S.-L. Cheng, Y.-J. Sheng, H.-K. Tsao, RSC Adv. 5, 53275 (2015)
Y. Yong, T. Yonezawa, M. Matsubara, H. Tsukamoto, J. Mater. Chem. C 3, 5890 (2015)
T. Yonezawa, H. Tsukamoto, Y. Yong, M. Thanh Nguyen, M. Matsubara, RSC Adv. 6, 12048 (2016)
D.M. Kalyon, E. Birinci, R. Yazici, B. Karuv, S. Walsh, Polym. Eng. Sci. 42, 1609 (2002)
Y. Hokita, M. Kanzaki, T. Sugiyama, R. Arakawa, H. Kawasaki, A.C.S. Appl, Mater. Interfaces 7, 19382 (2015)
P.A. Buffat, J.P. Borel, Phys. Rev. A 13, 2287 (1976)
S.H. Wu, D.H. Chen, J. Colloid Interface Sci. 273, 165 (2004)
P. Kanninen, C. Johans, J. Merta, K. Kontturi, J. Colloid Interface Sci. 318, 88 (2008)
J.L.C. Huaman, K. Sato, S. Kurita, T. Matsumoto, B. Jeyadevan, J. Mater. Chem. 21, 7062 (2011)
D. Deng, Y. Cheng, Y. Jin, T. Qi, F. Xiao, J. Mater. Chem. 22, 23989 (2012)
J. Mittal, K.-L. Lin, Mater. Charact. 109, 19 (2015)
J.W.M. Frenken, J.F. Vanderveen, Phys. Rev. Lett. 54, 134 (1985)
F.W. Young, J.V. Cathcart, A.T. Gwathmey, Acta Metall. 4, 145 (1956)
K.K. Jee, W.Y. Lee, J. Korean Phys. Soc. 52, 1673 (2008)
I. Kim, Y.A. Song, H.C. Jung, J.W. Joung, S.-S. Ryu, J. Kim, J. Electron. Mater. 37, 1863 (2008)
J.-K. Jung, S.H. Choi, I. Kim, H.C. Jung, J. Joung, Y.-C. Joo, Philos. Mag. 88, 339 (2008)
I. Kim, J. Kim, J. Appl. Phys. 108, 102807 (2010)
I. Jung, Y.H. Jo, I. Kim, H.M. Lee, J. Electron. Mater. 41, 115 (2012)
I. Kim, T.-M. Lee, J. Kim, J. Alloys Compd. 596, 158 (2014)
Y. Kim, B. Lee, S. Yang, I. Byun, I. Jeong, S.M. Cho, Curr. Appl. Phys. 12, 473 (2012)
S.B. Fredriksen, K.-J. Jens, Energy Procedia 37, 1770 (2013)
Acknowledgments
We thank Mr. Daisuke Murahashi and Ms. Kazuko Yamashita at Kansai University for the GC–MS measurements. This work was supported by JSPS KAKENHI (Grant Nos. 15H03520, 15H03526, 26505011 and 26107719) and Hitachi Metals Materials Science Foundation.
Author information
Authors and Affiliations
Corresponding author
Electronic supplementary material
Below is the link to the electronic supplementary material.
Rights and permissions
About this article
Cite this article
Sugiyama, T., Kanzaki, M., Arakawa, R. et al. Low-temperature sintering of metallacyclic stabilized copper nanoparticles and adhesion enhancement of conductive copper film to a polyimide substrate. J Mater Sci: Mater Electron 27, 7540–7547 (2016). https://doi.org/10.1007/s10854-016-4734-8
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-016-4734-8