Abstract
In this work, tin oxide (SnO2) and cobalt doped tin oxide (Co:SnO2) thin films are deposited by spray pyrolysis technique and the influence of doping concentration on the structural, morphological, electrical and optical properties of tin oxide films is analyzed and reported. X-ray diffraction pattern shows that the SnO2 and Co:SnO2 films are polycrystalline in nature and exhibit tetragonal crystal system. Co doping shifts the preferential growth orientation of SnO2 to (200) direction. Scanning electron microscopic studies show that the surface morphology of tin oxide films was effectively modified by various Co concentrations. X-ray photoelectron spectra of 5 at.% Co:SnO2 thin film reveal the presence of tin, oxygen, and cobalt. Carrier concentration and mobility of the SnO2 film decreases with increasing Co concentration and 0.5 at.% Co:SnO2 film acquires a mobility of 74 cm2/V s. The average optical transmittance of SnO2 thin film in the range of 500–800 nm increases due to Co doping.
Similar content being viewed by others
References
H. Cao, X. Qiu, Y. Liang, L. Zhang, M. Zhao, Q. Zhu, Chem. Phys. Chem 7, 497 (2006)
B. Drevillion, K. Satyendra, P. Rocaicabarrocas, J.M. Siffert, Appl. Phys. Lett. 54, 2088 (1989)
S.J. Laverty, H. Feng, P. Maguire, J. Electrochem. Soc. 144, 2165 (1997)
M.H. Madhusudhana Reddy, A.N. Chandorkar, Thin Solid Films 349, 260 (1999)
G. Frank, E. Kaur, H. Kostlin, Sol Energy Mater. 8, 387 (1983)
Y. Faber, F.K. Arefi, J. Amouroux, Thin Solid Films 241, 282 (1994)
T. Pisarkiewicz, T. Stapinski, Thin Solid Films 174, 277 (1989)
D. Zhang, L. Tao, Z. Deng, J. Zhang, L. Chen, Mater. Chem. Phys. 100, 275 (2006)
J.W. Elam, D.A. Baker, A.J. Hryn, A.B.F. Martinson, M.J. Pellin, J.T. Hupp, J. Vac. Sci. Technol. A 26(2), 245 (2008)
M.A. El Khakani, R. Dolbec, A.M. Serventi, M.C. Horrillo, M. Trudeau, R.G. Saint-Jacques, D.D. Rickerby, I. Sayago, Sens. Actuators B Chem. 77, 383 (2001)
D. Debaiyoti, R. Banerjee, Thin Solid Films 147, 321 (1987)
Q. Chen, Y. Qian, Z. Chen, G. Zhou, Y. Zhang, Thin Solid Films 264, 25 (1995)
S.P.S. Arya, Cryst. Res. Technol. 21, K38 (1986)
H. Cachet, J. Bruneaux, G. Folcher, C. Levy-Clement, C. Vard, M. Neumann-Spallart, Sol. Energy Mater. Sol. Cells. 46, 101 (1997)
T. Indira Gandhi, R. Ramesh Babu, K. Ramamurthi, Mater. Sci. Semicond. Process. 16, 472 (2013)
M.M.B. Mohagheghi, N. Shahtahmasebi, M.R. Alinejad, A. Youssefi, M.S. Saremi, Solid State Sci. 11, 233 (2009)
M.N. Rumyantseva, A.M. Gaskov, L.I. Ryabova, J.P. Senateur, B. Chenevier, M. Labeau, Mater. Sci. Eng. B Solid 41, 333 (1996)
K. Srinivas, M. Vithal, B. Sreedhar, M.M. Raja, P.V. Reddy, J. Phys. Chem. C 113, 3543 (2009)
S.S. Roy, J. Podder, J. Optoelectron. Adv. Mater. 12, 1479 (2010)
Z. Jiang, N. Jiamiao, Z. Xiujian, X. Yuli, J. Wuhan. Univ. Technol. Mater. Sci. Ed. 26, 388 (2011)
D.S. Han, J.H. Park, Y.J. Kang, J.W. Park, Microelectron. Reliab. 53, 1875 (2013)
G. Turgut, E.F. Keskenler, S. Aydin, E. Sonmez, S. Dogan, B. Duzgun, M. Ertugrul, J. Superlattice Microstruct. 56, 107 (2013)
B. Stjerna, C.G. Granqvist, J. Phys. D Appl. Phys. 26, 1011 (1993)
R. Mariappan, V. Ponnuswamy, P. Suresh, R. Suresh, M. Ragavendar, C. Sankar, Mater. Sci. Semicond. Process. 16, 825 (2013)
M. Weidner, J. Brotz, A. Klein, Thin Solid Films 555, 173 (2014)
Y. Huang, D. Li, J. Feng, G. Li, Q. Zhang, Semicond. Sci. Technol. 24(1–5), 015003 (2009)
N.F. Habubi, K.A. Mishjil, S.S. Chiad, Indian J. Phys. 87, 235 (2013)
M. Mehdi, B. Mohagheghi, M.S. Saremi, Phys. B 405, 4205 (2010)
G. Korotcenkov, B.K. Cho, M. Nazarov, D.Y. Noh, E.V. Kolesnikova, Curr. Appl. Phys. 10, 1123 (2010)
Y. Jiang, Y. Li, M. Yan, N. Bahlawane, J. Mater. Chem. 22, 16060 (2012)
E. Elangovan, K. Ramamurthi, J. Optoelectron. Adv. Mater. 5, 45 (2003)
JCPDS-International Centre for Diffraction Data, Card No. 41-1445, (1997)
E. Elangovan, S.A. Shivashankar, K. Ramamurthi, J. Cryst. Growth 276, 215 (2005)
M. Fantini, I. Torriani, Thin Solid Films 138, 255 (1986)
X. Liu, S. Chen, M. Li, X. Wang, Thin Solid Films 515, 6744 (2007)
M. Kwoka, L. Ottaviano, M. Passacantando, S. Santucci, G. Czempik, J. Szuber Thin Solid Films 490, 36 (2005)
J. Hays, A. Punnoose, R. Baldner, M.H. Engelhard, J. Peloquin, K.M. Reddy, Nanoparticles. Phys. Rev. B 72, 075203 (2005)
S.M. Rozati, E. Shadmani, J. Nanomater. Biostruct. 6, 365 (2011)
D.S.D. Amma, V.K. Vaidyan, P.K. Manoj, Mater. Chem. Phys. 93, 194 (2005)
S.Y. Ali, J. Muhammad, S. Tajammul, A.D. Ali, N.U. Rehman, M.H. Aziz, J. Mater. Sci. Mater. Electron. 24, 4924 (2013)
V. Senthilkumar, P. Vickraman, J. Mater. Sci. Mater. Electron. 21, 578 (2010)
L.M. Fang, X.T. Zu, Z.J. Li, S. Zhu, C.M. Liu, L.M. Wang, F. Gao, J. Mater. Sci. Mater. Electron. 19, 868 (2008)
Acknowledgments
One of the authors T. Indira Gandhi is thankful to UGC-BSR, Govt. of India for the award of ‘Research Fellowship in Science for Meritorious Students-2010’.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Indira Gandhi, T., Ramesh Babu, R., Ramamurthi, K. et al. Electrical and optical properties of Co2+:SnO2 thin films deposited by spray pyrolysis technique. J Mater Sci: Mater Electron 27, 1662–1669 (2016). https://doi.org/10.1007/s10854-015-3938-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-015-3938-7