Abstract
The TiO2 and Nitrogen doped TiO2 thin films were effectively synthesized on glass substrate for different Nitrogen doping concentration (4, 6, 8, 10 at.%) by Jet nebulizer spray technique. The XRD patterns revealed that the films were in anatase phase with the tetragonal structure. On observing SEM images, the occurrences of apparent agglomeration pattern were found in 8 at.% N-TiO2 thin film. The presence of elements was confirmed from EDX analysis. A considerable reduction in band gap was attained on increasing nitrogen concentration using UV–Visible spectroscopy. By analyzing the PL spectra, it is found that nitrogen incorporation on TiO2 lattice reduces the band to band recombination in the surface state emission. N-TiO2 thin film shows high persistent photoconductivity with slow decay.
Similar content being viewed by others
References
A.M. Bakhshayesh, M.R. Mohammadi, H. Dadar, D.J. Fray, Electrochim. Acta 90, 302 (2013)
S. Sadhu, A. Jaiswal, S. Adyanthaya, P. Poddar, RSC Adv. 3, 1933 (2013)
X. Cheng, H. Liu, Q. Chen, J. Li, P. Wang, Electrochim. Acta 108, 203 (2013)
M.M. Ba-Abbad, A.A.H. Kadhum, A.B. Mohamad, Int. J. Electrochem. Sci. 7, 4871 (2012)
H. Zuoli, Q. Wenxiu, X. Haixia, C. Jing, Y. Yuan, S. Peng, J. Am. Ceram. Soc. 95, 3941 (2012)
D.N. Patel, R. Jaiswal, T. Warang, G. Scarduelli, A. Dashora, B.L. Ahuja, D.C. Kothari, A. Miotello, Appl. Catal. B: Environ. 150, 74 (2014)
Y.W. Sakai, K. Obata, K. Hashimoto, H. Irie, Vacuum 83, 683 (2009)
A.R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, Y. Taga, Science 293, 296 (2001)
H. Wang, H. Li, J. Wang, J.N. Wu, D. Li, M. Liu, P. Su, Electrochim. Acta 137, 744 (2014)
M.J. Powell, R.G. Palgrave, C.W. Dunnill, I.P. Parkin, Thin Solid Films 562, 223 (2014)
R. Quesada-Cabrera, C. Sotelo-Vazquez, J.A. Darr, I.P. Parkin, Appl. Catal. B: Environ. 160, 582 (2014)
K.G. Grigorov, I.C. Oliveira, H.S. Maciel, M. Massi, M.S. Oliveira Jr, J. Amorim, C.A. Cunha, Surf. Sci. 605, 775 (2011)
B. Liu, L. Wen, X. Zhao, Sol. Energy Mater. Sol. Cells 92, 1 (2008)
P. Romero-Gomez, C. Lopez-Santos, A. Borras, J.P. Espinos, A. Palmero, A.R. Gonzalez-Elipe, Chem. Phys. Lett. 582, 95 (2013)
X. Hou, F. Liu, K. Yao, H. Ma, J. Deng, D. Li, B. Liao, Mater. Lett. 124, 101 (2014)
K. Pomoni, A. Vomvas, C. Trapalis, J. Non-Cryst. Solids 354, 4448 (2008)
S. Livraghi, A.M. Czoska, M.C. Paganini, E. Giamello, J. Solid State Chem. 182, 160 (2009)
D. Long, W. Li, L. Ling, J. Miyawaki, I. Mochida, S.-H. Yoon, Langmuir 26, 16096 (2010)
M. Grandcolas, J. Ye, J. Ceram. Process. Res. 13, 65 (2012)
D. Li, J. Zhang, L. Shao, C. Chen, G. Liu, Y. Yang, Rare Met. 30, 233 (2011)
M. Chekini, M.R. Mohammadizadeh, S.M.V. Allaei, Appl. Surf. Sci. 257, 7179 (2011)
V. Gowthami, P. Perumal, R. Sivakumar, C. Sanjeeviraja, Phys. B 452, 1 (2014)
K. Saravanakumar, V. Senthilkumar, C. Sanjeeviraja, M. Jayachandran, V. Ganesan, R. Koizhaiganova, T. Vasudevan, M.S. Lee, NANO: Brief Rep. Rev. 3, 469 (2008)
K. Saravanakumar, C. Gopinathan, K. Mahalakshmi, V. Ganesan, V. Sathe, C. Sanjeeviraja, Contemp. Eng. Sci. 4, 101 (2011)
P. Matheswaran, B. Gokul, K.M. Abhirami, R. Sathyamoorthy, Mater. Sci. Semicond. Process. 15, 486 (2012)
P. Sudhagar, K. Asokan, E. Ito, Y.S. Kang, Nanoscale 4, 2416 (2012)
S. Yaling, Y. Xiao, Y. Li, D. Yingxun, Mater. Chem. Phys. 126, 761 (2011)
T.S. Le, Q.B. Ngo, V.D. Nguyen, H.C. Nguyen, T.H. Dao, X.T. Tran, Adv. Nat. Sci.: Nanosci. Nanotechnol. 5, 015017 (2014)
A. Moses Ezhil Raj, V. Agnes, V. Bena Jothy, C. Ravidhas, Thin Solid Films 519, 129 (2010)
K. Pomoni, A. Vomvas, C. Trapalis, Thin Solid Films 516, 1271 (2008)
C. Xu, S.U.M. Khan, Electrochem. Solid-State Lett. 10, B56 (2007)
K.S. Usha, R. Sivakumar, C. Sanjeeviraja, J. Appl. Phys. 114, 123501 (2013)
P.J.L. Herve, L.K.J. Vandamme, J. Appl. Phys. 77, 5476 (1995)
B. Subhayan, N. Takayuki, H.M. Faruk, T. Takakazu, J. Phys: Conf. Ser. 100, 082015 (2008)
P. Sudhagar, R. Satyamoorthy, S. Chandramohan, Appl. Surf. Sci. 254, 1919 (2008)
D.A. Duarte, M. Massi, A.S. da Silva Sobrinho, Int. J. Photoenergy 2014, 1 (2014); Article ID 839757
D. Behera, B. Bag, R. Sakthivel, Indian J. Pure Appl. Phys. 49, 754 (2011)
G.S. Paul, P. Agarwal, J. Appl. Phys. 106, 103705 (2009)
Acknowledgments
This work was financially supported by the University Grants Commission, New Delhi, India [F.No. 42-903/2013(SR)] under Major Research Project Scheme (MRP) and Rajiv Gandhi National Fellowship (F1-17.1/2011-12/RGNF-SC-TAM-4843). The authors would like to record their sincere thanks to the commission.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Ravidhas, C., Anitha, B., Moses Ezhil Raj, A. et al. Effect of nitrogen doped titanium dioxide (N-TiO2) thin films by jet nebulizer spray technique suitable for photoconductive study. J Mater Sci: Mater Electron 26, 3573–3582 (2015). https://doi.org/10.1007/s10854-015-2871-0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-015-2871-0