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Structural and optical properties of nanocrystalline WO3 thin films

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Abstract

The nanocrystalline WO3 thin films were deposited by r.f. magnetron sputtering on quartz and p- type Si (100) substrates at a constant power of 25 W and at three different sputtering pressures (0.05, 0.01 and 0.5 mbar) and post annealed at different temperatures. The deposited films were characterized by XRD, UV–VIS spectrophotometry, ellipsometry and atomic force microscopy (AFM). The structural studies from XRD spectra reveals that the films deposited at 0.05 mbar and post annealed at 573 and 673 K have the predominant orthorhombic phase, whereas at 0.1 mbar and 573, 673 K triclinic phase is predominant. When sputtering pressure is at 0.5 mbar the predominant phase is monoclinic when annealed at 473 K and triclinic at 673 K. The optical energy gap is influenced significantly by sputtering pressure and post annealing temperatures. The optical energy gap of the films deposited at higher sputtering pressures and post annealed at lower temperatures is high due to smaller crystallite sizes. The thickness of all deposited films at different conditions is around 200 nm.

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Acknowledgments

The authors are thankful to A.K. Ray Chaudhari, Director, SNBNCBS, for allowing us to do AFM and the technicians Piyali Bose, Pallab, Nasiroddin Mondal and Shaktinath Das for their valuable help during this course of work.

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Authors and Affiliations

  1. Post Graduate Department of Physics, P.G. Centre, P.B. Siddartha College of Arts and Science, Vijayawada, Andhra Pradesh, 520010, India

    K. Srinivasa Rao & G. Srujana Devi

  2. LCMP, S.N. Bose National Centre for Basic Sciences, Salt Lake, Kolkata, 700098, India

    B. Rajini Kanth & P. K. Mukhopadhyay

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  1. K. Srinivasa Rao
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  2. B. Rajini Kanth
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  3. G. Srujana Devi
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Correspondence to K. Srinivasa Rao.

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Srinivasa Rao, K., Rajini Kanth, B., Srujana Devi, G. et al. Structural and optical properties of nanocrystalline WO3 thin films. J Mater Sci: Mater Electron 22, 1466–1472 (2011). https://doi.org/10.1007/s10854-011-0331-z

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  • DOI: https://doi.org/10.1007/s10854-011-0331-z

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