Abstract
The formation processes of A-centers in Czochralski grown silicon subjected to heat treatment at various temperatures and subsequent 60Co gamma-irradiation at room temperature are investigated in some detail. The absolute cross-sections of these processes are determined by the presence of one or several competing channels of vacancy trapping by oxygen and other structural defects in heat-treated materials. It is shown that this cross-section can be used for monitoring the effective trapping channels in Cz-Si after short heat treatment when electron microscopy appears to be little or not informative.
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Acknowledgement
The work was partly supported by Contract No 506962 (FP6-2002-IST-1) and by Grant of Federal Agency of Science and Innovations “Scientific School—5920.2006.2”.
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Emtsev, V.V., Emtsev, V.V. & Oganesyan, G.A. Formation rate of vacancy–oxygen complexes in heat-treated Czochralski grown silicon under gamma-irradiation. J Mater Sci: Mater Electron 18, 701–704 (2007). https://doi.org/10.1007/s10854-006-9109-0
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DOI: https://doi.org/10.1007/s10854-006-9109-0