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Wetting and reaction between Si droplet and SiO2 substrate

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Abstract

The wetting and reaction between Si melt and SiO2 substrate were investigated as a function of the atmosphere, temperature, and degree of vacuum. The results revealed that below 2 Torr with an Ar flow, the wetting angle is finally 90°. The Si droplet was stationary at a wetting angle of 90°. Videos indicated that the droplets moved and vibrated; Above 20 Torr, the Si droplet vibrated up and down with a frequency of approximately 2 Hz, thereby changing the wetting angle. Further, the droplet remained stationary on a substrate on which grooves with a width of 100 μm and depth of 100 μm were etched with a pitch of 1 mm. The presence of grooves or dimples on the substrates facilitated the leakage of SiO gas; as a result, the Si droplet did not vibrate. A vibration model was proposed in which the SiO gas produced at the interface between the Si droplet and the substrate according to the reaction Si + SiO = 2SiO expands and leaks continuously.

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References

  1. Niu Z, Mukai K, Shiraishi Y, Hibiya T, Kakimoto K, Koyama M (1996) J Jpn Crystal Growth 23(5):374

    CAS  Google Scholar 

  2. Mukai K et al (2000) Mater Trans JIM 41(5):639

    CAS  Google Scholar 

  3. Fujii H, Yamamoto M, Hara S, Nogi K (1999) J Mater Sci 34:3165

    Article  CAS  Google Scholar 

  4. Sugihara S, Okazaki K (1992) Materia Japan 31(3):197

    CAS  Google Scholar 

  5. Aksay IA, Hoge CE, Pask JA (1974) J Phys Chem 78(12):1178

    Article  CAS  Google Scholar 

  6. Marumo C, Pask JA (1977) J Mater Sci 12:223

    Article  CAS  Google Scholar 

  7. Standage AE, Gani MS (1967) J Am Ceram Soc 50(2):101

    Article  CAS  Google Scholar 

  8. Prabriputaloong K, Piggott MR (1973) J Am Ceram Soc 56(4):184

    Article  CAS  Google Scholar 

  9. Nagesh VK, Pask JA (1983) J Mater Sci 18:2665

    Article  CAS  Google Scholar 

  10. Ogino K et al (1982) J Jpn Inst Metal 46(10):957

    CAS  Google Scholar 

  11. Tomsia AP, Pask JA (1986) Dent Mater 2:10

    Article  CAS  Google Scholar 

  12. Sangiorgi R, Muolo ML, Ceramic developments (1988) In: Sorrel CC, Ben-Nissan B (eds) Mater Sci Forum 34–36:427

  13. Champion JA et al (1969) J Mater Sci 4:39

    Article  CAS  Google Scholar 

  14. Pask JA (1987) Ceramic Bull 66(11):1587

    CAS  Google Scholar 

  15. Sugihara S, Hirose Y (1994) J Ceram Soc Jpn 102(3):217

    CAS  Google Scholar 

  16. Levi G, Kaplan WD (2002) Acta Mater 50:75

    Article  CAS  Google Scholar 

  17. Taimatsu H et al (1985) J Jpn Inst Mater 49(7):523

    CAS  Google Scholar 

  18. Sugihara S, Okazaki K (1993) J Mater Sci 28:2455

    Article  CAS  Google Scholar 

  19. Sugihara S (1990) J Jpn Soc Powder Powder Metall 37(7):1052

    CAS  Google Scholar 

  20. Sugihara S, Okazaki K, Terashima Y, Kisamori K (1991) Jpn J Appl Phys 30(9B):2413

    Article  CAS  Google Scholar 

  21. Sugihara S et al (1998) J Korean Phys Soc 32(2):S1119

    CAS  Google Scholar 

  22. Sugihara S, Yamamoto M, Isobe T, Yutoh Y (2003) Adv Quant Chem 42:465

    Article  CAS  Google Scholar 

Download references

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Author notes

  1. Hiroshi Yamaguchi

    Present address: Center for Instrumental Analysis, College of Science & Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Sagamihara-shi, Kanagawa, 229-8558, Japan

Authors and Affiliations

  1. Analysis Technology Group, Core Technology Center, Covalent Materials Corporation, 30 Soya, Hadano-shi, 257-8566, Japan

    Hideyuki Kanai, Hiroshi Yamaguchi & Tomonori Uchimaru

  2. Department of Materials Science and Ceramic Technology, Shonan Institute of Technology, 1-1-25 Tsujido Nishikaigan, Fujisawa-shi, 251-8511, Japan

    Sunao Sugihara

  3. Quartz Crucibles Business Unit, Process Materials Division, Ceramics Business Group, Covalent Materials Corporation, 378 Ogunimachi Nishi-okitamagun, Yamagata, 999-1351, Japan

    Naoyuki Obata, Toshiyuki Kikuchi & Fusaki Kimura

  4. Technology Development Ceramic Business Group, Covalent Materials Corporation, Nissei Bldg., 6-3 Osaki 1-chome, Shinagawa-ku, Tokyo, 141-0032, Japan

    Masato Ichinokura

Authors
  1. Hideyuki Kanai
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Correspondence to Hideyuki Kanai.

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Kanai, H., Sugihara, S., Yamaguchi, H. et al. Wetting and reaction between Si droplet and SiO2 substrate. J Mater Sci 42, 9529–9535 (2007). https://doi.org/10.1007/s10853-007-2090-z

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  • DOI: https://doi.org/10.1007/s10853-007-2090-z

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