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Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition

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Abstract

Direct-patterned lead zirconate titanate (PZT) films prepared from an electron beam sensitive stock solution were investigated for advanced stage applications in sub 50-nm patterned systems. The required electron beam dose for the direct-patterning of PZT precursor films was 4.5 mC/cm2. The PZT precursor films with pattern size of 500 × 500 μm2 were exposed to an electron beam for 2 h and annealed at 400°C for 30 min under an O2 ambient. After exposure and annealing, values of the remnant polarization and coercive field were 7.0 μC/cm2 and 97 kV/cm at 10 V, respectively. These results suggest a possible application of PZT films in micro- or nano-electromechanical systems.

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Acknowledgements

This work was supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-311-D00636). The experiments performed at the PLS were supported in part by the MOST and the POSTECH.

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Authors and Affiliations

  1. Department of Ceramic Engineering, Yonsei University, 134, Shinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea

    Hyeong-Ho Park, Hong-Sub Lee & Hyung-Ho Park

  2. 4D Labs and Department of Chemistry, Simon Fraser University, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada

    Xin Zhang & Ross H. Hill

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  1. Hyeong-Ho Park
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  2. Hong-Sub Lee
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Correspondence to Hyung-Ho Park.

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Park, HH., Lee, HS., Park, HH. et al. Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition. J Electroceram 24, 214–218 (2010). https://doi.org/10.1007/s10832-008-9560-9

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