Skip to main content
Log in

An improved tunnel field-effect transistor with an L-shaped gate and channel

  • Published:
Journal of Computational Electronics Aims and scope Submit manuscript

Abstract

An improved tunnel field-effect transistor with an L-shaped gate and channel (LLTFET) is proposed herein. The new structure shows an increased ON-current without any change in the overall area in comparison with state-of-the-art structures. The L-shaped gate extends into the substrate and overlaps with part of the source. An N+ pocket located just below the gate facilities tunneling in both the horizontal and vertical directions, which results in the increased ON-current. Three different models are proposed herein to increase the ON-current with the added advantage of simplified fabrication steps. For one of the proposed models, the ON-current is improved by 63% while the OFF-current is reduced to 12.5% compared with an L-shaped gate TFET (LGTFET) described in literature. An optimum model is also proposed, achieving a subthreshold swing of 21.2 mV/decade at 0.05\(V_{\mathrm{gs}}\). The simulations are performed using Silvaco ATLAS with the nonlocal band to band tunneling (BTBT) model.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8
Fig. 9

Similar content being viewed by others

References

  1. Choi, W.Y., Park, B.G., Lee, J.D., Liu, T.J.K.: Tunneling field-effect transistors (TFETs) with subthreshold swing (SS) less than 60 mV/dec. IEEE Electron Device Lett. 28(8), 743–745 (2007). https://doi.org/10.1109/LED.2007.901273

    Article  Google Scholar 

  2. Seabaugh, A.C., Zhang, Q.: Low-voltage tunnel transistors for beyond CMOS logic. Proc. IEEE 98(12), 2095–2110 (2010). https://doi.org/10.1109/JPROC.2010.2070470

    Article  Google Scholar 

  3. Kim, S.W., Kim, J.H., Liu, T.J.K., Choi, W.Y., Park, B.G.: Demonstration of L-shaped tunnel field-effect transistors. IEEE Trans. Electron Device 63(4), 1774–1778 (2016). https://doi.org/10.1109/TED.2015.2472496

    Article  Google Scholar 

  4. Wang, W., Wang, P.F., Zhang, C.M., Lin, X., Liu, X.Y., Sun, Q.Q., Zhou, P., Zhang, D.W.: Design of U-shape channel tunnel FETs with SiGe source regions. IEEE Trans. Electron Device 61(1), 193–197 (2014). https://doi.org/10.1109/TED.2013.2289075

    Article  Google Scholar 

  5. Yang, Z.: Tunnel field-effect transistor with an L-shaped gate. IEEE Electron Device Lett. 37(7), 839–842 (2016). https://doi.org/10.1109/LED.2016.2574821

    Article  Google Scholar 

  6. Abdi, D.B., Kumar, M.J.: In-built N+ pocket p-n-p-n tunnel field-effect transistor. IEEE Electron Device Lett. 35(12), 1170–1172 (2014). https://doi.org/10.1109/LED.2014.2362926

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Nithin Abraham.

Additional information

Publisher's Note

Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Abraham, N., James, R.K. An improved tunnel field-effect transistor with an L-shaped gate and channel. J Comput Electron 19, 304–309 (2020). https://doi.org/10.1007/s10825-020-01450-4

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10825-020-01450-4

Keywords

Navigation