Skip to main content

Advertisement

Log in

A new high-performance phototransistor design based on both surface texturization and graded gate doping engineering

  • Published:
Journal of Computational Electronics Aims and scope Submit manuscript

Abstract

In this paper, we propose a new optically controlled field effect transistor, OC-FET, based on both surface texturization and graded gate doping engineering. The proposed design consists of a gate with both graded doping and surface texturization aspects to ensure high efficient light absorption and low dark current, respectively. Moreover, using an analytical investigation, an overall performance comparison of the proposed dual texturized gate (DTG) OC-FET device and conventional OC-FETs has been studied in order to confirm the enhanced optical and electrical performance of the proposed design in terms of increased photoresponsivity (R), optical gain \((G), I_{ON}/I_{OFF}\) ratio, drain current driving capability \((I_{DMAX})\) and high signal to noise ratio. Simulations show very good agreement between the results of the developed analytical models and those of TCAD software for wide range of design parameters. The developed analytical models are used to formulate the objective functions to optimize the device performance using a multi-objective genetic algorithm (MOGA). The proposed MOGA-based approach is used to search the optimal design parameters, for which the electrical and optical device performance is maximized. The obtained superior electrical performance suggests that our DTG OC-FET offers great promise as optical sensors and transducers for CMOS-based optical communications.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7

Similar content being viewed by others

References

  1. Colace, L., Sorianello, V., Rajamani, S.: Investigation of static and dynamic characteristics of optically controlled field effect transistors. J. Lightwave Technol. 32, 2233–2239 (2014)

    Article  Google Scholar 

  2. Ichikawa, R., Takita, S., Ishikawa, Y., Wada, K.: Germanium as a material to enable silicon photonics. In: Silicon Photonics II: Components and Integration, vol. 119, pp. 131–141. Springer, Ottawa (2011)

  3. Michel, J., Liu, J., Kimerling, L.C.: High-performance Ge-on-Si photodetectors. Nat. Photon. 4, 527–534 (2010)

    Article  Google Scholar 

  4. Sorianello, V., Colace, L., Rajamani, S., Assanto, G.: Design and simulation of optically controlled field effect transistors. Phys. Status Solidi C 11, 81–84 (2014)

    Article  Google Scholar 

  5. Kuo, M.H., Lai, W.T., Hsu, T.M., Chen, Y.C., Chang, C.W., Chang, W.H., Li, P.W.: Designer germanium quantum dot phototransistor for near infrared optical detection and amplification. Nanotechnology 26, 55203–55212 (2015)

    Article  Google Scholar 

  6. Sahni, S., Luo, X., Liu, J., Xie, Y., Yablonovitch, E.: Junction field-effect transistor-based germanium photodetector on silicon-on-insulator. Opt. Lett. 33, 1138–1140 (2008)

    Article  Google Scholar 

  7. Rajamani, S., Sorianello, V., De Iacovo, A., Colace, L.: Simulations of Ge based optically controlled field effect transistors. In: IEEE 11th International Conference on Group IV Photonics (GFP), Paris, France (2014)

  8. Taghinejad, M., Taghinejad, H., Ganji, M., Rostamian, A., Mohajerzadeh, S., Abdolahad, M., Kolahdouz, M.: Integration of Ni2Si/Si nanograss heterojunction on n-MOSFET to realize high-sensitivity phototransistors. IEEE Trans. Electron Devices 61, 3239–3244 (2014)

    Article  Google Scholar 

  9. Bencherif, H., Djeffal, F., Kacha, K., Arar, D.: Analytical Investigation of SiGe solar cell including texture morphology effects. In: IEEE 4th International Conference on Systems and Control (ICSC), Sousse, Tunisia (2015)

  10. Springer, J., Poruba, A., Vanecek, M.: Improved three-dimensional optical model for thin-film silicon solar cells. J. Appl. Phys. 2004, 5329–5337 (2004)

    Article  Google Scholar 

  11. Krc, J., Smole, F., Topic, M.: Potential of light trapping in microcrystalline silicon solar cells with textured substrates. Prog. Photovolt. Res. Appl. 11, 429–436 (2003)

    Article  Google Scholar 

  12. Kanematsu, D., Yata, S., Aya, Y., Terakawa, A., Iseki, M.: Quantitative measurement and design of texture morphology for high efficiency thin-film silicon solar cells. Jap. J. Appl. Phys. 53, 076501 (2014)

    Article  Google Scholar 

  13. Weste, N.H.E., Eshraghian, K.: Principles of CMOS VLSI Design: A System Perspective, 2nd edn. Addison-Wesley, Reading (1993)

    Google Scholar 

  14. Sze, S.M., Ng, K.K.: Physics of Semiconductor Devices, 3rd edn. Wiley, New York (2007)

    Google Scholar 

  15. Atlas User’s manual, SILVACO TCAD (2012)

  16. Djeffal, F., Chahdi, M., Benhaya, A., Hafiane, M.L.: An approach based on neural computation to simulate the nanoscale CMOS circuits: application to the simulation of CMOS inverter. Solid-State Electron. 51, 26–34 (2007)

    Article  Google Scholar 

  17. Jin, Z., Gao, L., Zhou, Q., Jizheng, W.: High-performance flexible ultraviolet photoconductors based on solution-processed ultrathin ZnO/Au nanoparticle composite films. Sci. Rep. 4, 4268 (2014)

  18. Djeffal, F., Lakhdar, N.: An improved analog electrical performance of submicron dual-material gate (DM) GaAs-MESFETs using multi-objective computation. J Comput. Electron. 12, 29–35 (2013)

    Article  Google Scholar 

  19. Bendib, T., Djeffal, F.: Electrical performance optimization of nanoscale double-gate MOSFETs using multi-objective genetic algorithms. IEEE Trans. Electron Devices 58, 3743–3750 (2011)

  20. Fang, J., Gao, Y., Sun, G., Xu, C., Li, Q.: Multiobjective robust design optimization of fatigue life for a truck cab. Reliab. Eng. Syst. Saf. 135, 1–8 (2015)

    Article  Google Scholar 

  21. Djeffal, F., Meguellati, M.: Multigate RADFET dosimeter for radioactive environment monitoring applications. Lecture Notes in Electrical Engineering (LNEE) 229, pp. 301–313 (2013)

  22. Djeffal, F., Bendib, T.: Multi-objective genetic algorithms based approach to optimize the electrical performances of the gate stack double gate (GSDG) MOSFET. Microelectron. J. 42, 661–666 (2011)

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to F. Djeffal.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Djeffal, F., Ferhati, H. A new high-performance phototransistor design based on both surface texturization and graded gate doping engineering. J Comput Electron 15, 301–310 (2016). https://doi.org/10.1007/s10825-015-0752-7

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10825-015-0752-7

Keywords

Navigation