Abstract
In this paper we study the influence of emission/absorption processes due to optical phonons on the electrical properties of multigate silicon nanowire transistors. We show that low-energy phonons reduce drain current through backscattering of carriers by emission/absorption processes while high-energy phonons redistribute the current energy spectrum along the nanowire channel through phonon emission without significantly reducing the drain current drive. The influence of emission/absorption is investigated in different multigate silicon FET structures with uniform channel, single impurity, random doping atom distribution and oxide tunnel barriers. A three-dimensional quantum mechanical device simulator based on the NEGF formalism in coupled mode-space approach is used to model electron transport in the presence of optical phonon scattering mechanism. Electron-phonon scattering is accounted for by adopting the self-consistent Born approximation and using the deformation potential theory.
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Acknowledgements
This work was supported by the Science Foundation Ireland grants 05/IN/I888 and 10/IN.1/I2992, the European project SQWIRE under Grant Agreement No. 257111 and the European Community (EC) Seventh Framework Program through the Network of Excellence Nano-TEC under Contract 257964. This work has also been enabled by the Programme for Research in Third-Level Institutions.
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Dehdashti Akhavan, N., Ferain, I., Yu, R. et al. Emission and absorption of optical phonons in Multigate Silicon Nanowire MOSFETs. J Comput Electron 11, 249–265 (2012). https://doi.org/10.1007/s10825-012-0411-1
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DOI: https://doi.org/10.1007/s10825-012-0411-1