When surfactants are present in polishing compositions severe damage is done to the initial crystal structure of a very thin (tenths and hundredths of a micron thick) surface layer of the material (silicon) being processed and the deformation-strength properties of the material change as a result of the Rebinder effect. The use of active additives in polishing compositions, including unconventional ones, makes it possible to decrease the thickness of the damaged layer by a factor of 1.5 – 2, significantly increasing the polishing efficiency in the process.
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Translated from Steklo i Keramika, No. 5, pp. 29 – 32, May, 2014.
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Kanaev, A.A., Gorodetskii, A.E. Formation of the Crystalline Structure of a Silicon Surface in Active Media During Polishing. Glass Ceram 71, 169–171 (2014). https://doi.org/10.1007/s10717-014-9644-8
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DOI: https://doi.org/10.1007/s10717-014-9644-8