Abstract
A novel method for fabricating a three-layer SU-8 mould with inverted T-shaped cavities is presented. The first two SU-8 layers were spin coated and exposed separately, and simultaneously developed to fabricate the bottom and the horizontal part of the inverted T-shaped cavity. Then, a positive photoresist was filled into the cavity, and a wet lapping process was performed to remove the excess photoresist and make a temporary substrate. The third SU-8 layer was spin coated on the temporary substrate to make the vertical part of the inverted T-shaped cavity. The sacrificial photoresist layer can prevent the first two SU-8 layers from being secondly exposed, and make a temporary substrate for the third SU-8 layer at the same time. Moreover, the photoresist can be easily removed with the development of the third SU-8 layer. A polydimethylsiloxane (PDMS) microchip with arrays of T-shaped cantilevers for studying the mechanics of cells was fabricated by using the SU-8 mould.
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Acknowledgments
This work was supported by the National Natural Science Foundation of China (51075056, 81301040, 91023046, 11372243), Program for New Century Excellent Talents in University of China (NCET-10-0284, NCET-12-0437), International Science & Technology Cooperation Program of China (2013DFG02930, S2013GR0241), China Young 1000-Talent Program, Dalian Foundation of Science and Technology (2012J21DW002), and Program for Youth Science and Technology Star of Shaanxi Province (2014KJXX-76).
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Liu, J., Zhang, D., Sha, B. et al. Fabrication of a three-layer SU-8 mould with inverted T-shaped cavities based on a sacrificial photoresist layer technique. Biomed Microdevices 16, 655–660 (2014). https://doi.org/10.1007/s10544-014-9868-y
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DOI: https://doi.org/10.1007/s10544-014-9868-y