Abstract
The dynamic contact line behavior of water on nanotextured rough hydrophobic and superhydrophobic surfaces is studied and contrasted to smooth hydrophobic surfaces for application in immersion lithography. Liquid loss occurs at the receding meniscus when the smooth substrate is accelerated beyond a critical velocity of approximately 1 m/s. Nanotexturing the surface with average roughness values even below 10 nm results in critical velocity larger than 2.5 m/s, the upper limit of the apparatus. This unexpected increase in critical velocity is observed for both sticky hydrophobic and slippery superhydrophobic surfaces. The authors attribute this large increase in critical velocity both in increased receding contact angle and in increased slip length for such nanotextured surfaces.
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Acknowledgments
Financial support by the FP7 Marie Curie Initial Training Network “Surface Physics for Advanced Manufacturing” project ITN 215723 is kindly acknowledged. Author A.K. Gnanappa would like to thank Koen Winkels (University of Twente) for the help with MATLAB code. The authors also wish to thank Nasos Botsialas (NCSR Demokritos, Athens) for providing micro-drilling of PMMA samples.
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Gnanappa, A.K., Gogolides, E., Evangelista, F. et al. Contact line dynamics of a superhydrophobic surface: application for immersion lithography. Microfluid Nanofluid 10, 1351–1357 (2011). https://doi.org/10.1007/s10404-010-0762-5
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DOI: https://doi.org/10.1007/s10404-010-0762-5