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Formation and dielectric properties of anodic oxide films on Zr–Al alloys

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Abstract

Zr–Al alloys containing up to 26 at.% aluminum, prepared by magnetron sputtering, have been anodized in 0.1 mol dm−3 ammonium pentaborate electrolyte, and the structure and dielectric properties of the resultant anodic oxide films have been examined by grazing incidence X-ray diffraction, transmission electron microscopy, Rutherford backscattering spectroscopy, and AC impedance spectroscopy. The anodic oxide film formed on zirconium consists of monoclinic and tetragonal ZrO2 with the former being a major phase. Two-layered anodic oxide films, comprising an outer thin amorphous layer and an inner main layer of crystalline tetragonal ZrO2 phase, are formed on the Zr–Al alloys containing 5 to 16 at.% aluminum. Further increase in the aluminum content to 26 at.% results in the formation of amorphous oxide layer throughout the thickness. The anodic oxide films become thin with increasing aluminum content, while the relative permittivity of anodic oxide shows a maximum at the aluminum content of 11 at.%. Due to major contribution of permittivity enhancement, the maximum capacitance of the anodic oxide films is obtained on the Zr–11 at.% Al alloy, being 1.7 times than on zirconium at the formation voltage of 100 V.

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Acknowledgement

The present work was supported in part by the Global COE Program (Project No. B01: Catalysis as the Basis for Innovation in Materials Science) from the Ministry of Education, Culture, Sports, Science and Technology, Japan.

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Authors and Affiliations

  1. Division of Materials Chemistry, Faculty of Engineering, Hokkaido University, Sapporo, 060-8628, Japan

    Shun Koyama, Yoshitaka Aoki & Hiroki Habazaki

  2. Institute for Materials Research, Tohoku University, Sendai, 980-8577, Japan

    Shinji Nagata

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  1. Shun Koyama
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  2. Yoshitaka Aoki
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  3. Shinji Nagata
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  4. Hiroki Habazaki
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Correspondence to Hiroki Habazaki.

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Koyama, S., Aoki, Y., Nagata, S. et al. Formation and dielectric properties of anodic oxide films on Zr–Al alloys. J Solid State Electrochem 15, 2221–2229 (2011). https://doi.org/10.1007/s10008-010-1238-y

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  • DOI: https://doi.org/10.1007/s10008-010-1238-y

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