Skip to main content
SpringerLink
Log in

Electrodeposition for obtaining homogeneous or heterogeneous cobalt-copper films

  • Original Paper
  • Published:
Journal of Solid State Electrochemistry Aims and scope Submit manuscript

Abstract

Direct electrodeposition of heterogeneous deposits may be an alternative method for preparing cobalt-copper coatings with magnetoresistive properties. Co-Cu electrodeposition was obtained in sulfate baths containing different citrate concentrations in order to prepare either homogeneous or heterogeneous Co-Cu deposits. X-ray diffraction (XRD) and voltammetric stripping analysis were used to study the kind of deposits formed. Citrate-free baths produced heterogeneous films, although dendritic growth was observed, thus increasing the deposit's thickness. Increasing the Cu(II)/Co(II) ratio in solution enabled the formation of smoother deposits. The presence of citrate at up to twice the total metallic concentration in the bath improved the morphological aspects of the deposits, their structural heterogeneity being maintained. Higher citrate concentrations induced the loss of heterogeneity, and both electrochemical and diffraction peaks tended towards single peaks. Homogeneous Co-Cu deposits, formed by a solid solution structure, were obtained in highly complexed citrate baths.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1. A
Fig. 2.
Fig. 3.
Fig. 4.
Fig. 5.
Fig. 6.
Fig. 7.
Fig. 8.
Fig. 9. A

Similar content being viewed by others

References

  1. Berkowitz AE, Mitchell JR, Carey MJ, Young AP, Zhang S, Spada FE, Parker FT, Huttem A, Thomas G (1992) Phys Rev Lett 68:3745

    Article  CAS  PubMed  Google Scholar 

  2. Xiao JQ, Jiang JS, Chien CL (1992) Phys Rev Lett 68:3749

    Article  CAS  PubMed  Google Scholar 

  3. Setna RP, Cerezo A, Hyde JM, Smith GDW (1994) Appl Surf Sci 76/77:203

    Google Scholar 

  4. Fedosyuk VM, Kasyutich OI, Ravinder D, Blythe HJ (1996) J Magn Magn Mater 156:345

    Article  CAS  Google Scholar 

  5. Schwarzacher W, Lashmore DS (1996) IEEE Trans Magn 32:3133

    Article  CAS  Google Scholar 

  6. Tsunoda M, Okuyama K, Ooba M, Takahashi M (1998) J Appl Phys 83:7004

    Google Scholar 

  7. Zaman H, Yamada A, Fukuda H, Ueda Y (1998) J Electrochem Soc 145:565

    CAS  Google Scholar 

  8. Viegas ADC, Geshev J, Schmidt JE, Ferrari EF (1998) J Appl Phys 83:565

    Google Scholar 

  9. Kakazei GN, Krovetz AF, Lesnik NA, Pereira de Azevedo MM, Pogorelov YuG, Bondorkova GV, Silantiev VL, Sousa JB (1999) J Magn Magn Mater 196:29

    Article  Google Scholar 

  10. Ueda Y, Houga T, Zaman H, Yamada A (1999) J Solid State Chem 147:274

    Article  CAS  Google Scholar 

  11. Childress JR, Chien CL (1991) Phys Rev B 43:8089

    Google Scholar 

  12. Childress JR, Chien CL (1991) J Appl Phys 70:5885

    Google Scholar 

  13. Parashar S, Raju AR, Rao CNR (1999) Mater Chem Phys 61:46

    Article  CAS  Google Scholar 

  14. Schmool D, Garcia-Arribas A, Abad E, Garitaonandia JS, Fdez-Gubieda ML, Barandiaran JM (1999) J Magn Magn Mater 203:73

    Article  CAS  Google Scholar 

  15. Dellogu F, Pintore M, Enzo S, Cardellini F, Contini V, Montone A, Rosato V (1997) Philos Mag B 76:651

    Google Scholar 

  16. Liu BX, Ma E, Li J, Huang LJ (1997) Nucl Instr Methods Phys Res B 19/20:682

    Google Scholar 

  17. ASM (1992) Alloy phase diagrams. In: Baker H (ed) ASM handbook, vol.3. ASM International, Ohio

  18. Blythe HJ, Fedosyuk VM (1996) J Magn Magn Mater 155:352

    Article  CAS  Google Scholar 

  19. Gómez E, Llorente A, Vallés E (2000) J Electroanal Chem 495:19

    Article  Google Scholar 

  20. Gómez E, Labarta A, Llorente A, Vallés E (2001) J Electroanal Chem 517:63

    Article  Google Scholar 

Download references

Acknowledgements

The authors wish to thank the Serveis Cientificotècnics (Universitat de Barcelona) for providing equipment. This research was supported financially by contracts MAT 2000-0986 from the Spanish Comisión Interministerial de Ciencia y Tecnología (CICYT) and by the Comissionat of the Generalitat de Catalunya under Research Project SGR 2000-017.

Author information

Authors and Affiliations

  1. Electrodep, Departament de Química Física, Universitat de Barcelona, Martí i Franquès 1, 08028 , Barcelona, Spain

    Elvira Gómez, Albert Llorente & Elisa Vallés

  2. Serveis Cientificotècnics, Universitat de Barcelona, Lluis Solé i Sabaris 1–3, 08028 , Barcelona, Spain

    Xavier Alcobe

Authors
  1. Elvira Gómez
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Albert Llorente
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Xavier Alcobe
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Elisa Vallés
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Elisa Vallés.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Gómez, E., Llorente, A., Alcobe, X. et al. Electrodeposition for obtaining homogeneous or heterogeneous cobalt-copper films. J Solid State Electrochem 8, 82–88 (2004). https://doi.org/10.1007/s10008-003-0358-z

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10008-003-0358-z

Keywords

Search

Navigation