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3-D PTFE microstructure fabricated using synchrotoron radiation etching

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Abstract

Microfabrication technique using SR ablation for 3-D polytetrafluoroethylene (PTFE) structure is reported in this work. First of all, we investigated necessary basic data for the fabricated structure like the processing depth and the etching rate, etc. And, the exposure energy distribution was given to the surface of polytetrafluoroethylene by using the plane pattern to cross-section transfer (PCT) technique, 3-D microstructures was fabricated. To establish three dimension of highly accurate PTFE processing technology, we are researching the application to the device.

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References

  • Nishi N, Katoh T, Ueno H, Konishi S, Sugiyama S (1999) 3-Dimensional micromachining of PTFE using synchrotron radiation direct photo-etching. In: Proceedings of MHS, Nagoya, pp 93–98

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Acknowledgments

The authors would like to thank Mr. Hiroyuki Ikeda, a technician in the SR center, Ritsumeikan University, for his technical assistance.

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Authors and Affiliations

  1. Graduate School of Science and Engineering, Ritsumeikan University, 1-1-1 Noji-Higashi, Kusatsu, Shiga, 525-8577, Japan

    Mitsuhiro Horade, Sommawan Khumpuang & Susumu Sugiyama

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  1. Mitsuhiro Horade
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  2. Sommawan Khumpuang
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  3. Susumu Sugiyama
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Correspondence to Mitsuhiro Horade.

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Horade, M., Khumpuang, S. & Sugiyama, S. 3-D PTFE microstructure fabricated using synchrotoron radiation etching. Microsyst Technol 14, 1695–1698 (2008). https://doi.org/10.1007/s00542-008-0576-5

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  • DOI: https://doi.org/10.1007/s00542-008-0576-5

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