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Concave microlens array mold fabrication in photoresist using UV proximity printing

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Abstract

This paper presents a simple and effective method for fabricating a polydimethyl-siloxane (PDMS) microlens array with a high fill factor. The proposed method utilizes the UV proximity printing and photoresist replication methods. A concave microlens array mold is made using a printing gap in a lithography process. Optical UV light diffraction of UV light is used to deflect light away from the aperture edges to produce a certain exposure in the photo-resist material outside the aperture edges. This method can precisely control the geometric profile of a concave microlens array. The experimental results show that a concave micro-lens array can be formed automatically in photo-resist when the printing gap ranges from 240 to 720 μm. A high fill factor microlens array can be produced when the control pitch distance between the adjacent apertures of the concave microlens array is decreased to the aperture size.

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Acknowledgment

This work was supported by the National Science Council (series no. NSC94-2212-E-005-016) of Taiwan, R.O.C.

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Authors and Affiliations

  1. Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan, 106

    Tsung-Hung Lin & Ching-Kong Chao

  2. Institute of Precision Engineering, National Chung Hsing University, Taichung, Taiwan, 402

    Hsiharng Yang

  3. Center of Nanoscience and Nanotechnology, National Chung Hsing University, Taichung, Taiwan, 402

    Hsiharng Yang

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  1. Tsung-Hung Lin
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  2. Hsiharng Yang
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  3. Ching-Kong Chao
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Correspondence to Hsiharng Yang.

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Lin, TH., Yang, H. & Chao, CK. Concave microlens array mold fabrication in photoresist using UV proximity printing. Microsyst Technol 13, 1537–1543 (2007). https://doi.org/10.1007/s00542-006-0264-2

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  • DOI: https://doi.org/10.1007/s00542-006-0264-2

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